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Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
The practice of shaping the irradiance profile of laser beams goes back more than three decades, and the applications of beam shaping are as diverse as they are numerous. However, until Dickey and Holswade's groundbreaking and highly popular Laser Beam Shaping: Theory and Techniques was published, there was no single, detailed treatment available on the underlying theory and basic techniques of beam shaping. Building on the foundations of this previous work, these esteemed editors have teamed with recognized expert David L. Shealy to produce the first in-depth account of beam shaping applications and design. Laser Beam Shaping Applications details the important features of beam shaping and e...
The practical, popular 1995 tutorial has been thoroughly revised and updated, reflecting developments in technology and applications during the past decade. New chapters address wave aberrations, thermal effects, design examples, and diamond turning.
Annotation This tutorial fully explains cathode ray tube (CRT) based displays in a single, easy-to-understand narrative. Detailed explanations and insights into performance properties and safety limits of the various glass melts follow a discussion of the fundamentals. In addition, other topics covered include the architectural differences between color and monochrome, the cathode (electron beam source) as a failure mode for all CRTs, types of cathodes available and their life expectancy. Phosphors, the metrics involved in defining a pixel and how distortions can influence the net results, defining CRT compliance with the DICOM Grayscale Standard Display Function (GSDF), test patterns and how they provide information about display performance, and video cards round out this informative work.
This tutorial introduces the theory and applications of MTF, used to specify the image quality achieved by an imaging system. It covers basic linear systems theory and the relationship between impulse response, resolution, MTF, OTF, PTF, and CTF. Practical measurement and testing issues are discussed.
Morphological image processing, a standard part of the imaging scientist's toolbox, can be applied to a wide range of industrial applications. Concentrating on applications, this text shows how to analyse the problems and then develop successful algorithms to solve them.
This tutorial explains performance and quality considerations in medical imaging displays. After defining performance requirements for high-fidelity displays, the book introduces the display technologies that are likely to be used in medical imaging workstations.
This introduction to uncooled infrared focal plane arrays and their applications is aimed at professionals, students, and end users. Topics include principal uncooled thermal detection mechanisms; fundamental performance limits and theoretical performance; the state of the art; and applications, technical trends, and systems employing uncooled arrays.
This book supplies the optical component and systems designer, and quality assurance engineers and managers with the definitions, measurement principles, and standard metrics used to characterize high-quality specular surfaces. The author covers both the traditional visual methods as well as newer (but not necessarily better) computer-aided techniques and describes the metrics adopted by the new ISO standards, including the setting of form and finish tolerances. Key issues of industry are raised, to help stimulate research and development of new methods and standards that blend the best of the old and new approaches to surface assessment.