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Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices
An extrapolation of ULSI scaling trends indicates that minimum feature sizes below 0.1 mu and gate thicknesses of Audience: Both expert scientists and engineers who wish to keep up with cutting edge research, and new students who wish to learn more about the exciting basic research issues relevant to next-generation device technology.
Defects in SiO2 and Related Dielectrics: Science and Technology
Silicon dioxide plays a central role in most contemporary electronic and photonic technologies, from fiber optics for communications and medical applications to metal-oxide-semiconductor devices. Many of these applications directly involve point defects, which can either be introduced during the manufacturing process or by exposure to ionizing radiation. They can also be deliberately created to exploit new technologies. This book provides a general description of the influence that point defects have on the global properties of the bulk material and their spectroscopic characterization through ESR and optical spectroscopy.
Frontiers in Electronics
The 2002 Workshop on Frontiers in Electronics was the third in the series of WOFE workshops. Over 70 leading experts from academia, industry, and government agencies reported on the most recent developments in their fields and exchanged views on future trends and directions of the electronics and photonics industry. The issues they addressed ranged from system-on-chip to DNA doping, from ultrathin SOI to electrotextiles, from photonics integration on the ULSI platform to wide band gap semiconductor devices and solid state lighting. The rapid pace of electronic technology evolution compels a merger of different technical areas, and WOFE-02 provided a unique opportunity for cross-fertilization...
Rapid Thermal and Other Short-time Processing Technologies
The proceedings from this May 2000 symposium illustrate the range of applications in Rapid Thermal Processing (RTP). The refereed papers cover a variety of issues, such as ultra-shallow junctions; contacts for nanoscale CMOS; gate stacks; new applications of RTP, such as for the enhanced crystalization of amorphous silicon thin films; and advances on RTP systems and process monitoring, including optimizing and controlling gas flows in an RTCVD reactor. Most presentations are supported by charts and other graphical data. c. Book News Inc.
High Dielectric Constant Materials
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.
Archives in Russia: A Directory and Bibliographic Guide to Holdings in Moscow and St.Petersburg
This is a comprehensive directory and bibliographic guide to Russian archives and manuscript repositories in the capital cities of Moscow and St. Petersburg. It is an essential resource for any researcher interested in Russian sources for topics in diplomatic, military, and church history; art; dance; film; literature; science; ethnolography; and geography. The first part lists general bibliographies of relevant reference literature, directories, bibliographic works, and specialized subject-related sources. In the following sections of the directory, archival listings are grouped in institutional categories. Coverage includes federal, ministerial, agency, presidential, local, university, Academy of Sciences, organizational, library, and museum holdings. Individual entries include the name of the repository (in Russian and English), basic information on location, staffing, institutional history, holdings, access, and finding aids. More comprehensive and up-to-date than the 1997 Russian Version, this edition includes Web-site information, dozens of additional repositories, several hundred more bibliographical entries, coverage of reorganization issues, four indexes, and a glossary.
Advanced Bioscience and Biosystems for Detection and Management of Diabetes
This book covers the medical condition of diabetic patients, their early symptoms and methods conventionally used for diagnosing and monitoring diabetes. It describes various techniques and technologies used for diabetes detection. The content is built upon moving from regressive technology (invasive) and adapting new-age pain-free technologies (non-invasive), machine learning and artificial intelligence for diabetes monitoring and management. This book details all the popular technologies used in the health care and medical fields for diabetic patients. An entire chapter is dedicated to how the future of this field will be shaping up and the challenges remaining to be conquered. Finally, it shows artificial intelligence and predictions, which can be beneficial for the early detection, dose monitoring and surveillance for patients suffering from diabetes
Comprehensive Semiconductor Science and Technology
Semiconductors are at the heart of modern living. Almost everything we do, be it work, travel, communication, or entertainment, all depend on some feature of semiconductor technology. Comprehensive Semiconductor Science and Technology, Six Volume Set captures the breadth of this important field, and presents it in a single source to the large audience who study, make, and exploit semiconductors. Previous attempts at this achievement have been abbreviated, and have omitted important topics. Written and Edited by a truly international team of experts, this work delivers an objective yet cohesive global review of the semiconductor world. The work is divided into three sections. The first sectio...
Fundamental Aspects of Silicon Oxidation
Discusses silicon oxidation in a tutorial fashion from both experimental and theoretical viewpoints. The authors report on the state of the art both at Lucent Technology and in academic research. The book will appeal to researchers and advanced students.
