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Catalog of an exhibition held at The Museum of Modern Art, New York, Feb. 19-May 14, 2012.
¡Printing the Revolution!
Printing and collecting the revolution : the rise and impact of Chicano graphics, 1965 to now / E. Carmen Ramos -- Aesthetics of the message : Chicana/o posters, 1965-1987 / Terezita Romo -- War at home : conceptual iconoclasm in American printmaking / Tatiana Reinoza -- Chicanx graphics in the digital age / Claudia E. Zapata.
Art for Yale
None
Art in America
None
Stealing My Religion
Liz Bucar navigates the thorny terrain of religious appropriation, from yoga classes to non-Muslims who signal allyship by donning hijabs. Exploring the ethics of alleged appropriations, Bucar argues that borrowing isn’t itself a problem, as long as we are invested in our enthusiasms—committed to understanding their roots and diverse meanings.
Stimulus Class Formation in Humans and Animals
Stimulus class formation has been studied independently by two groups of researchers. One group has come out of a learning theory approach, while the second has developed out of a behavior analytic tradition. The purpose of the present volume is to further establish the ties between these two research areas while allowing for differences in approach to the questions asked. The book is loosely organized around four themes. The first two sections deal with what constitutes functional and equivalence classes in animals and humans. In the third section, the authors attempt to identify stimulus control variables that contribute to the formation of equivalences classes. The last section deals with the complex issue of the role of verbal behavior in equivalence classes. The goal of the book is to provide the reader with a better understanding of the current state of research and theory in stimulus class formation. It is also hoped that it will stimulate research into how and under what conditions, stimulus classes can form.
Materials and Processes for Next Generation Lithography
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on ...
