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CRC Handbook of Metal Etchants
This publication presents cleaning and etching solutions, their applications, and results on inorganic materials. It is a comprehensive collection of etching and cleaning solutions in a single source. Chemical formulas are presented in one of three standard formats - general, electrolytic or ionized gas formats - to insure inclusion of all necessary operational data as shown in references that accompany each numbered formula. The book describes other applications of specific solutions, including their use on other metals or metallic compounds. Physical properties, association of natural and man-made minerals, and materials are shown in relationship to crystal structure, special processing te...
Etching in Microsystem Technology
Microcomponents and microdevices are increasingly finding application in everyday life. The specific functions of all modern microdevices depend strongly on the selection and combination of the materials used in their construction, i.e., the chemical and physical solid-state properties of these materials, and their treatment. The precise patterning of various materials, which is normally performed by lithographic etching processes, is a prerequisite for the fabrication of microdevices. The microtechnical etching of functional patterns is a multidisciplinary area, the basis for the etching processes coming from chemistry, physics, and engineering. The book is divided into two sections: the wet and dry etching processes are presented in the first, general, section, which provides the scientific fundamentals, while a catalog of etching bath composition, etching instructions, and parameters can be found in the second section. This section will enhance the comprehension of the general section and also give an overview of data that are essential in practice.
Dry Etching Technology for Semiconductors
This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.
Studies of Ice Etching
Thermal etching of ice and its application to the investigation of surface abrasion in ice crystals is explained. Investigations of surface abrasion in ice crystals provide fundamental information in the study of snow and ice friction. The technique of producing evaporation etch pits by the application of Formvar film to the ice crystal surface is described, and the development of microcrystals by recrystallization is compared with the surrounding mother crystals. Experimental data are presented and discussed with emphasis on the development of thermal etch pits, scratches on different crystal faces, damage to the prismatic face, thermal etch channels on the basal plane, predominant orientation of etch channels on the basal plane, and etch-pit-free zones and stress concentrations around solid inclusions. (Author).
Handbook of Semiconductor Manufacturing Technology
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five enti...
Diffractive Optics
This book provides the reader with the broad range of materials that were discussed in a series of short courses presented at Georgia Tech on the design, fabrication, and testing of diffractive optical elements (DOEs). Although there are not long derivations or detailed methods for specific engineering calculations, the reader should be familiar and comfortable with basic computational techniques. This text is not a 'cookbook' for producing DOEs, but it should provide readers with sufficient information to assess whether this technology would benefit their work, and to understand the requirements for using the concepts and techniques presented by the authors.
Dental Hard Tissues and Bonding
This text comprehensively reviews bonding to enamel, dentin and cementum, and analyses relevent adhesion mechanisms. Emphasis is placed on the characterization of material interfaces with dental tissues in situ.
Microelectronic Materials and Processes
The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come to...
