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The Physics of Hydrogenated Amorphous Silicon II
  • Language: en
  • Pages: 370

The Physics of Hydrogenated Amorphous Silicon II

With contributions by numerous experts

Naval Research Reviews
  • Language: en
  • Pages: 480

Naval Research Reviews

  • Type: Book
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  • Published: 1987
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  • Publisher: Unknown

None

Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices
  • Language: en
  • Pages: 503

Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices

An extrapolation of ULSI scaling trends indicates that minimum feature sizes below 0.1 mu and gate thicknesses of Audience: Both expert scientists and engineers who wish to keep up with cutting edge research, and new students who wish to learn more about the exciting basic research issues relevant to next-generation device technology.

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface--4, 2000
  • Language: en
  • Pages: 562

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface--4, 2000

  • Type: Book
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  • Published: 2000
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  • Publisher: Unknown

None

Frontiers In Electronics (With Cd-rom) - Proceedings Of The Wofe-04
  • Language: en
  • Pages: 774

Frontiers In Electronics (With Cd-rom) - Proceedings Of The Wofe-04

Frontiers in Electronics reports on the most recent developments and future trends in the electronics and photonics industry. The issues address CMOS, SOI and wide band gap semiconductor technology, terahertz technology, and bioelectronics, providing a unique interdisciplinary overview of the key emerging issues.This volume accurately reflects the recent research and development trends: from pure research to research and development; and its contributors are leading experts in microelectronics, nanoelectronics, and nanophotonics from academia, industry, and government agencies.

Physical Properties of Amorphous Materials
  • Language: en
  • Pages: 448

Physical Properties of Amorphous Materials

The Institute for Amorphous Studies was founded in 1982 as the international center for the investigation of amorphous mate rials. It has since played an important role in promoting the und er standing of disordered matter in general. An Institute lecture series on "Fundamentals of Amorphous Materials and Devices" was held during 1982-83 with distinguished speakers from universities and industry. These events were free and open to the public ,and were attended by many representatives of the scientific community. The lectures themselves were highly successful inasmuch as they provided not only formal instruction but also an opportunity for vigorous and stimulating debate. That last element co...

The Jahn-Teller Effect
  • Language: en
  • Pages: 912

The Jahn-Teller Effect

The Jahn-Teller effect continues to be a paradigm for structural instabilities and molecular dynamical processes. This volume provides a survey of the current Jahn-Teller interactions at the interface of quantum chemistry and condensed matter physics.

Fundamental Physics of Amorphous Semiconductors
  • Language: en
  • Pages: 190

Fundamental Physics of Amorphous Semiconductors

The Kyoto Summer Institute 1980 (KSI '80), devoted to "Fundamental Physics of Amorphous Semiconductors", was held at Research Institute for Fundamental Physics (RIFP), Kyoto University, from 8-11 September, 1980. The KSI '80 was the successor of the preceding Institutes which were held in July 1978 on "Particle Physics and Accelerator Projects" and in September 1979 on "Physics of Low-Dimensional Systems". The KSI '80 was attended by 200 participants, of which 36 were from abroad: Canada, France, Korea, Poland, U.K., U.S.A, U.S.S.R., and the Federal Republic of Germany. The KSI '80 was organized by RIFP and directed by the Amorphous Semicon ductor group in Japan. A few years ago, we started ...

Materials Fundamentals of Gate Dielectrics
  • Language: en
  • Pages: 477

Materials Fundamentals of Gate Dielectrics

This book presents materials fundamentals of novel gate dielectrics that are being introduced into semiconductor manufacturing to ensure the continuous scalling of the CMOS devices. This is a very fast evolving field of research so we choose to focus on the basic understanding of the structure, thermodunamics, and electronic properties of these materials that determine their performance in device applications. Most of these materials are transition metal oxides. Ironically, the d-orbitals responsible for the high dielectric constant cause sever integration difficulties thus intrinsically limiting high-k dielectrics. Though new in the electronics industry many of these materials are wel known...

Defects in Microelectronic Materials and Devices
  • Language: en
  • Pages: 772

Defects in Microelectronic Materials and Devices

  • Type: Book
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  • Published: 2008-11-19
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  • Publisher: CRC Press

Uncover the Defects that Compromise Performance and ReliabilityAs microelectronics features and devices become smaller and more complex, it is critical that engineers and technologists completely understand how components can be damaged during the increasingly complicated fabrication processes required to produce them.A comprehensive survey of defe