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Physics and Technology of High-k Gate Dielectrics I
  • Language: en
  • Pages: 330

Physics and Technology of High-k Gate Dielectrics I

  • Type: Book
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  • Published: 2003
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  • Publisher: Unknown

None

The Computer Engineering Handbook
  • Language: en
  • Pages: 1409

The Computer Engineering Handbook

  • Type: Book
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  • Published: 2001-12-26
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  • Publisher: CRC Press

There is arguably no field in greater need of a comprehensive handbook than computer engineering. The unparalleled rate of technological advancement, the explosion of computer applications, and the now-in-progress migration to a wireless world have made it difficult for engineers to keep up with all the developments in specialties outside their own

Enzyme Handbook
  • Language: en
  • Pages: 1122

Enzyme Handbook

Recent progress on enzyme immobilisation, enzyme production, coenzyme re generation and enzyme engineering has opened up fascinating new fields for the potential application of enzymes in a large range of different areas. As more progress in research and application of enzymes has been made the lack of an up-to-date overview of enzyme molecular properties has become more appar ent. Therefore, we started the development of an enzyme data information sys tem as part of protein-design activities at GBF. The present book "Enzyme Hand book" represents the printed vers ion of this data bank. In future a computer searchable version will be also available. The enzymes in this Handbook are arranged a...

Sustainable Energy Technologies
  • Language: en
  • Pages: 343

Sustainable Energy Technologies

This book provides an up-to-date review of the status and prospects of different options in energy conversion and storage technologies, as seen by a panel of world leading experts. It offers a platform for readers engaged in planning and undertaking new energy solutions, or retrofitting and redesigning the existing installations, to confront and to compare the pros and cons of various novel technology options. This book presents state-of-the-art papers on a timely topic.

The VLSI Handbook
  • Language: en
  • Pages: 2322

The VLSI Handbook

  • Type: Book
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  • Published: 2018-10-03
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  • Publisher: CRC Press

For the new millenium, Wai-Kai Chen introduced a monumental reference for the design, analysis, and prediction of VLSI circuits: The VLSI Handbook. Still a valuable tool for dealing with the most dynamic field in engineering, this second edition includes 13 sections comprising nearly 100 chapters focused on the key concepts, models, and equations. Written by a stellar international panel of expert contributors, this handbook is a reliable, comprehensive resource for real answers to practical problems. It emphasizes fundamental theory underlying professional applications and also reflects key areas of industrial and research focus. WHAT'S IN THE SECOND EDITION? Sections on... Low-power electr...

Advanced Gate Stack, Source/drain, and Channel Engineering for Si-based CMOS 2
  • Language: en
  • Pages: 472

Advanced Gate Stack, Source/drain, and Channel Engineering for Si-based CMOS 2

These proceedings describe processing, materials, and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topics: strained Si/SiGe and Si/SiGe on insulator; high-mobility channels including III-V¿s, etc.; nanowires and carbon nanotubes; high-k dielectrics, metal and FUSI gate electrodes; doping/annealing for ultra-shallow junctions; low-resistivity contacts; advanced deposition (e.g. ALD, CVD, MBE), RTP, UV, plasma and laser-assisted processes.

Cumulated Index Medicus
  • Language: en
  • Pages: 1646

Cumulated Index Medicus

  • Type: Book
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  • Published: 1998
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  • Publisher: Unknown

None

Nano-CMOS Gate Dielectric Engineering
  • Language: en
  • Pages: 249

Nano-CMOS Gate Dielectric Engineering

  • Type: Book
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  • Published: 2017-12-19
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  • Publisher: CRC Press

According to Moore’s Law, not only does the number of transistors in an integrated circuit double every two years, but transistor size also decreases at a predictable rate. At the rate we are going, the downsizing of CMOS transistors will reach the deca-nanometer scale by 2020. Accordingly, the gate dielectric thickness will be shrunk to less than half-nanometer oxide equivalent thickness (EOT) to maintain proper operation of the transistors, leaving high-k materials as the only viable solution for such small-scale EOT. This comprehensive, up-to-date text covering the physics, materials, devices, and fabrication processes for high-k gate dielectric materials, Nano-CMOS Gate Dielectric Engi...

ULSI Process Integration III
  • Language: en
  • Pages: 620

ULSI Process Integration III

None

Riemannian Optimization and Its Applications
  • Language: en
  • Pages: 136

Riemannian Optimization and Its Applications

This brief describes the basics of Riemannian optimization—optimization on Riemannian manifolds—introduces algorithms for Riemannian optimization problems, discusses the theoretical properties of these algorithms, and suggests possible applications of Riemannian optimization to problems in other fields. To provide the reader with a smooth introduction to Riemannian optimization, brief reviews of mathematical optimization in Euclidean spaces and Riemannian geometry are included. Riemannian optimization is then introduced by merging these concepts. In particular, the Euclidean and Riemannian conjugate gradient methods are discussed in detail. A brief review of recent developments in Riemannian optimization is also provided. Riemannian optimization methods are applicable to many problems in various fields. This brief discusses some important applications including the eigenvalue and singular value decompositions in numerical linear algebra, optimal model reduction in control engineering, and canonical correlation analysis in statistics.