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Electronic Devices Architectures for the NANO-CMOS Era
  • Language: en
  • Pages: 426

Electronic Devices Architectures for the NANO-CMOS Era

  • Type: Book
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  • Published: 2019-05-08
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  • Publisher: CRC Press

In this book, internationally recognized researchers give a state-of-the-art overview of the electronic device architectures required for the nano-CMOS era and beyond. Challenges relevant to the scaling of CMOS nanoelectronics are addressed through different core CMOS and memory device options in the first part of the book. The second part reviews new device concepts for nanoelectronics beyond CMOS. The book covers the fundamental limits of core CMOS, improving scaling by the introduction of new materials or processes, new architectures using SOI, multigates and multichannels, and quantum computing.

Advanced MOS Devices and their Circuit Applications
  • Language: en
  • Pages: 161

Advanced MOS Devices and their Circuit Applications

  • Type: Book
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  • Published: 2024-01-08
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  • Publisher: CRC Press

This text comprehensively discusses the advanced MOS devices and their circuit applications with reliability concerns. Further, an energy-efficient Tunnel FET-based circuit application will be investigated in terms of the output voltage, power efficiency, energy consumption, and performances using the device circuit co-design approach. The book: Discusses advanced MOS devices and their circuit design for energy- efficient systems on chips (SoCs) Covers MOS devices, materials, and related semiconductor transistor technologies for the next-generation ultra-low-power applications Examines the use of field-effect transistors for biosensing circuit applications and covers reliability design consi...

Additive Manufacturing of Structural Electronics
  • Language: en
  • Pages: 154

Additive Manufacturing of Structural Electronics

Additive manufacturing, also called rapid prototyping or 3D printing is a disruptive manufacturing technique with a significant impact in electronics. With 3D printing, bulk objects with circuitry are embedded in the volume of an element or conformally coated on the surface of existing parts, allowing design and manufacturing of smaller and lighter products with fast customisation. The book covers both materials selection and techniques. The scope also covers the research areas of additive manufacturing of passive and active components, sensors, energy storage, bioelectronics and more.

Dielectrics for Nanosystems II
  • Language: en
  • Pages: 352

Dielectrics for Nanosystems II

This issue covers papers relating to advanced semiconductor products that are true representatives of nanoelectics and that have reached below 100nm. Depending on the application, the nanosystem may consist of one or more of the following types of functional components: electronic, optical, magnetic, mechanical, biological, chemical, energy source, and various types of sensing devices. As long as one or more of these fuctional devices is in the 1-100nm dimensions, the resultant system can be defined as a nanosystem. Papers will be in all areas of dielectric issues in nanosystems. In addtional to traditional areas of semiconductor processing and packaging of nanoelectronics, emphasis will be placed on areas where multifunctional device integration (through innovation in design, materials, and processing at the device and system levels) will lead to new applications of nanosystems.

Frontiers In Electronics (With Cd-rom) - Proceedings Of The Wofe-04
  • Language: en
  • Pages: 774

Frontiers In Electronics (With Cd-rom) - Proceedings Of The Wofe-04

Frontiers in Electronics reports on the most recent developments and future trends in the electronics and photonics industry. The issues address CMOS, SOI and wide band gap semiconductor technology, terahertz technology, and bioelectronics, providing a unique interdisciplinary overview of the key emerging issues.This volume accurately reflects the recent research and development trends: from pure research to research and development; and its contributors are leading experts in microelectronics, nanoelectronics, and nanophotonics from academia, industry, and government agencies.

Science and Technology of Dielectrics for Active and Passive Devices
  • Language: en
  • Pages: 53

Science and Technology of Dielectrics for Active and Passive Devices

The papers included in this issue of ECS Transactions were originally presented in the symposium ¿Science and Technology of Dielectrics for Active and Passive Devices¿, held during the PRiME 2008 joint international meeting of The Electrochemical Society and The Electrochemical Society of Japan, with the technical cosponsorship of the Japan Society of Applied Physics, the Korean Electrochemical Society, the Electrochemistry Division of the Royal Australian Chemical Institute, and the Chinese Society of Electrochemistry. This meeting was held in Honolulu, Hawaii, from October 12 to 17, 2008.

Micro Total Analysis Systems 2004
  • Language: en
  • Pages: 644

Micro Total Analysis Systems 2004

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Frontiers in Electronics
  • Language: en
  • Pages: 784

Frontiers in Electronics

Frontiers in Electronics reports on the most recent developments and future trends in the electronics and photonics industry. The issues address CMOS, SOI and wide band gap semiconductor technology, terahertz technology, and bioelectronics, providing a unique interdisciplinary overview of the key emerging issues. This volume accurately reflects the recent research and development trends: from pure research to research and development; and its contributors are leading experts in microelectronics, nanoelectronics, and nanophotonics from academia, industry, and government agencies.

Integrated Nanodevice and Nanosystem Fabrication
  • Language: en
  • Pages: 288

Integrated Nanodevice and Nanosystem Fabrication

  • Type: Book
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  • Published: 2017-11-22
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  • Publisher: CRC Press

Since its invention, the integrated circuit has necessitated new process modules and numerous architectural changes to improve application performances, power consumption, and cost reduction. Silicon CMOS is now well established to offer the integration of several tens of billions of devices on a chip or in a system. At present, there are important challenges in the introduction of heterogeneous co-integration of materials and devices with the silicon CMOS 2D- and 3D-based platforms. New fabrication techniques allowing strong energy and variability efficiency come in as possible players to improve the various figures of merit of fabrication technology. Integrated Nanodevice and Nanosystem Fa...