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Applications of Kinetic Modelling
  • Language: en
  • Pages: 737

Applications of Kinetic Modelling

  • Type: Book
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  • Published: 1999-05-07
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  • Publisher: Elsevier

Volume 37 is concerned with the use and role of modelling in chemical kinetics and seeks to show the interplay of theory or simulation with experiment in a diversity of physico-chemical areas in which kinetics measurements provide significant physical insight. Areas of application covered within the volume include electro- and interfacial chemistry, physiology, biochemistry, solid state chemistry and chemical engineering. A leading contributor to this general area has been Professor W. John Albery, FRS, to whom the contributors and editors dedicate this book.

High-Temperature Superconductors and Novel Inorganic Materials
  • Language: en
  • Pages: 328

High-Temperature Superconductors and Novel Inorganic Materials

Research into high-Tc materials demands the co-operation of physicists, chemists and materials scientists to discover the best solutions to the most important challenges presented by the field. In the fifth annual Workshop on High Temperature Superconductors and Novel Inorganic Materials Engineering, the topic is extended beyond high-Tc superconductivity to include other advanced oxide materials, mainly colossal magnetoresistance materials, which are closely related to the ceramic superconductors. This book covers the synthesis, characterisation (both structural and physical) and engineering of this class of materials.

Chemical Vapour Deposition
  • Language: en
  • Pages: 600

Chemical Vapour Deposition

"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket

Proceedings of the Ninth International Conference on Chemical Vapor Deposition, 1984
  • Language: en
  • Pages: 828

Proceedings of the Ninth International Conference on Chemical Vapor Deposition, 1984

  • Type: Book
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  • Published: 1984
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  • Publisher: Unknown

None

CVD of Nonmetals
  • Language: en
  • Pages: 441

CVD of Nonmetals

Written by leading experts in the field, this practical reference handbook offers an up-to-date, critical survey of the chemical vapor deposition (CVD) of nonmetals, a key technology in semiconductor electronics, finishing, and corrosion protection. The basics necessary for any CVD process are discussed in the introduction. In the following chapters, precursor requirements, with an emphasis on materials chemistry, common structures of reactants and substrates, as well as reaction control are discussed for a broad range of compositions including superconducting, conducting, semiconducting, insulating and structural materials. Technological issues, such as reactor geometries and operation para...

Mechanisms of Reactions of Organometallic Compounds with Surfaces
  • Language: en
  • Pages: 292

Mechanisms of Reactions of Organometallic Compounds with Surfaces

A NATO Advanced Research Workshop on the "Mechanisms of Reactions of Organometallic Compounds with Surfaces" was held in St. Andrews, Scotland in June 1988. Many of the leading international researchers in this area were present at the workshop and all made oral presentations of their results. In addition, significant amounts of time were set aside for Round Table discussions, in which smaller groups considered the current status of mechanistic knowledge, identified areas of dispute or disagreement, and proposed experiments that need to be carried out to resolve such disputes so as to advance our understanding of this important research area. All the papers presented at the workshop are collected in this volume, together with summaries of the conclusions reached at the Round Table discussions. The workshop could not have taken place without financial support from NATO, and donations were also received from Associated Octel, Ltd., STC Ltd., and Epichem Ltd., for which the organisers are very grateful. The organisation of the meeting was greatly assisted by Mrs G. MacArthur and Mr L.R. Dunley of the Chemistry Department, St. Andrews University.

Chemical Vapor Deposition
  • Language: en
  • Pages: 477

Chemical Vapor Deposition

None

CVD XV
  • Language: en
  • Pages: 826

CVD XV

None

Main Chemistry Group
  • Language: en
  • Pages: 433

Main Chemistry Group

  • Type: Book
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  • Published: 2000-04-19
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  • Publisher: Elsevier

Advances in Inorganic Chemistry presents timely and informative summaries of the current progress in a variety of subject areas within inorganic chemistry, ranging from bioinorganic to solid state. This acclaimed serial features reviews written by experts in the area and is an indispensable reference to advanced researchers. Each volume of Advances in Inorganic Chemistry contains an index, and each chapter is fully referenced.