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Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 5: New Materials, Processes, and Equipment
  • Language: en
  • Pages: 367

Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 5: New Materials, Processes, and Equipment

This issue of ¿ECS Transactions¿ describes processing, materials and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topics include strained Si/SiGe and Si/SiGe on insulator; high-mobility channels including III-V¿s, etc.; nanowires and carbon nanotubes; high-k dielectrics, metal and FUSI gate electrodes; doping/annealing for ultra-shallow junctions; low-resistivity contacts; advanced deposition (e.g. ALD, CVD, MBE), RTP, UV, plasma and laser-assisted processes.

The Rochester Directory
  • Language: en
  • Pages: 696

The Rochester Directory

  • Type: Book
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  • Published: 1873
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  • Publisher: Unknown

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Handbook of Vacuum Science and Technology
  • Language: en
  • Pages: 861

Handbook of Vacuum Science and Technology

  • Type: Book
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  • Published: 1997-10-29
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  • Publisher: Elsevier

The Handbook of Vacuum Technology consists of the latest innovations in vacuum science and technology with a strong orientation towards the vacuum practitioner. It covers many of the new vacuum pumps, materials, equipment, and applications. It also details the design and maintenance of modern vacuum systems. The authors are well known experts in their individual fields with the emphasis on performance, limitations, and applications rather than theory. There aremany useful tables, charts, and figures that will be of use to the practitioner. - User oriented with many useful tables, charts, and figures of use to the practitioner - Reviews new vacuum materials and equipment - Illustrates the design and maintenance of modern vacuum systems - Includes well referenced chapters

Defects in HIgh-k Gate Dielectric Stacks
  • Language: en
  • Pages: 516

Defects in HIgh-k Gate Dielectric Stacks

The main goal of this book is to review at the nano and atomic scale the very complex scientific issues that pertain to the use of advanced high dielectric constant (high-k) materials in next generation semiconductor devices. One of the key obstacles to integrate this novel class of materials into Si nano-technology are the electronic defects in high-k dielectrics. It has been established that defects do exist in high-k dielectrics and they play an important role in device operation. The unique feature of this book is a special focus on the important issue of defects. The subject is covered from various angles, including silicon technology, processing aspects, materials properties, electrica...

ULSI Science and Technology/1997
  • Language: en
  • Pages: 686

ULSI Science and Technology/1997

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Growth of Germanium Crystals by Reacting Gold with Germane and Selective Gold Removal
  • Language: en
  • Pages: 232
High Tc Update
  • Language: en
  • Pages: 392

High Tc Update

  • Type: Book
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  • Published: 1991
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  • Publisher: Unknown

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With Announcements for the Winter Semester and the Spring Semester of ... and ...
  • Language: en
  • Pages: 614
Opto-VLSI Devices and Circuits for Biomedical and Healthcare Applications
  • Language: en
  • Pages: 218

Opto-VLSI Devices and Circuits for Biomedical and Healthcare Applications

  • Type: Book
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  • Published: 2023-09-04
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  • Publisher: CRC Press

The text comprehensively discusses the latest Opto-VLSI devices and circuits useful for healthcare and biomedical applications. It further emphasizes the importance of smart technologies such as artificial intelligence, machine learning, and the internet of things for the biomedical and healthcare industries. Discusses advanced concepts in the field of electro-optics devices for medical applications. Presents optimization techniques including logical effort, particle swarm optimization and genetic algorithm to design Opto-VLSI devices and circuits. Showcases the concepts of artificial intelligence and machine learning for smart medical devices and data auto-collection for distance treatment....

Research in Materials
  • Language: en
  • Pages: 620

Research in Materials

  • Type: Book
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  • Published: 1993
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  • Publisher: Unknown

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