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Diffusion Phenomena
This authoritative test introduces the basic aspects of diffusion phenomena and their methods of solution through physical examples. It emphasizes modeling and methodology, bridging the gap between physico chemical statements of certain kinetic processes and their reduction to diffusion problems. Author Richard Ghez draws upon his experience in the areas of metallurgy and semiconductor technology to present physically significant examples that will prove of interest to a wide range of scientists — physicists, chemists, biologists, and applied mathematicians. Prerequisites include a rigorous year of calculus and a semester of thermodynamics. The opening chapter on the diffusion equation is succeeded by chapters on steady-state examples, diffusion under external forces, and simple time-dependent examples. An introduction to similarity is followed by explorations of surface rate limitations and segregation, a user's guide to the Laplace transform, and further time-dependent examples.
Multivariable and Vector Calculus
This book covers multivariable and vector calculus. It can be used as a textbook for a one-semester course or self-study. It includes worked-through exercises, with answers provided for many of the basic computational ones and hints for the more complex ones.. This second edition features new exercises, new sections on twist and binormal vectors for curves in space, linear approximations, and the Laplace and Poisson equations.
Ferroelectric Thin Films
The impetus for the rapid development of thin film technology, relative to that of bulk materials, is its application to a variety of microelectronic products. Many of the characteristics of thin film ferroelectric materials are utilized in the development of these products - namely, their nonvolatile memory and piezoelectric, pyroelectric, and electro-optic properties. It is befitting, therefore, that the first of a set of three complementary books with the general title Integrated Ferroelectric Devices and Technologies focuses on the synthesis of thin film ferroelectric materials and their basic properties. Because it is a basic introduction to the chemistry, materials science, processing, and physics of the materials from which integrated ferroelectrics are made, newcomers to this field as well as veterans will find this book self-contained and invaluable in acquiring the diverse elements requisite to success in their work in this area. It is directed at electronic engineers and physicists as well as process and system engineers, ceramicists, and chemists involved in the research, design, development, manufacturing, and utilization of thin film ferroelectric materials.
Simulation of Semiconductor Processes and Devices 2001
This volume contains the Proceedings of the International Conference on Simulation of Semiconductor Devices and Processes, SISPAD 01, held on September 5–7, 2001, in Athens. The conference provided an open forum for the presentation of the latest results and trends in process and device simulation. The trend towards shrinking device dimensions and increasing complexity in process technology demands the continuous development of advanced models describing basic physical phenomena involved. New simulation tools are developed to complete the hierarchy in the Technology Computer Aided Design simulation chain between microscopic and macroscopic approaches. The conference program featured 8 invited papers, 60 papers for oral presentation and 34 papers for poster presentation, selected from a total of 165 abstracts from 30 countries around the world. These papers disclose new and interesting concepts for simulating processes and devices.
Crystalline Symmetries, An Informal Mathematical Introduction
Crystalline Symmetries: an informal mathematical introduction is a guided tour through the maze of mathematical models and classifications that are used today to describe the symmetries of crystals. The mathematical basis of crystallography and the interpretation of The International Tables for X-ray Crystallography are explained in a heuristic and accessible way. In addition to discussing standard crystals, a special feature of this book is the chapter on generalised crystals and the Penrose tile model for the kinds of generalised crystals known as quasicrystals. This fruitful interaction between pure mathematics (symmetry, tilings) and physics should prove invaluable to final year undergraduate/graduate physicists and materials scientists; the reader gets a flavour of the powerful coherence of a group theoretical approach to crystallography. Mathematicians interested in applications of group theory to physical science will also find this book useful.
Diffusion in Materials DIMAT-2017
10th International Conference on Diffusion in Materials Selected, peer reviewed papers from the 10th International Conference on Diffusion in Materials (DIMAT-2017), Haifa, Israel, May 7-12, 2017.
Diffusion Phenomena
This book is a second edition of the one that was published by John Wiley & Sons in 1988. It carries a new title because the former one, A Primer of Diffusion Problems, gave the impression of consisting merely of a set of problems relating to diffusion. Nonetheless, my intention was clearly spelled out and it remains the same, namely, to teach basic aspects and methods of solution for diffusion phenomena through physical examples. Again, I emphasize that the coverage is not encyclopedic. There exist already several outstanding works of that nature, for example, J. Philibert's Atom Movements, Diffusion and Mass Transport in Solids. My emphasis is on modeling and methodology. This book should ...
