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Pits and Pores 4: New Materials and Applications - In Memory of Ulrich Gösele
  • Language: en
  • Pages: 256

Pits and Pores 4: New Materials and Applications - In Memory of Ulrich Gösele

This issue of ECS Transactions contains 24 refereed manuscripts from the 46 papers presented over three days at the International Symposium on Pits and Pores IV: New Materials and Applications held in Las Vegas, NV as part of the 218th Meeting of the Electrochemical Society, October 10-15, 2010. The Symposium was held in memory of Ulrich Gösele, one of the founders and a key scientist in the field of porous semiconductors who recently passed away. These proceedings are anticipated to be beneficial not only for the tailored preparation of porous materials for various applications but also as a source of insights with respect to the origin and nature of localized dissolution processes in metals and semiconductors.

Semiconductor Wafer Bonding 11: Science, Technology, and Applications - In Honor of Ulrich Gösele
  • Language: en
  • Pages: 656

Semiconductor Wafer Bonding 11: Science, Technology, and Applications - In Honor of Ulrich Gösele

Semiconductor wafer bonding continues to evolve as a crucial technology extending new integration schemes and disseminating new product architectures in such diverse areas as high quality silicon-on-insulator (SOI) materials for electronic applications, Si-Ge strained layers, Germanium-on-Insulator (GeOI), 3D device integration, Si on quartz or glass for thin film displays, compound semiconductor-on-Si heterostructures and Micro-Electro-Mechanical Systems.

Handbook of Wafer Bonding
  • Language: en
  • Pages: 435

Handbook of Wafer Bonding

The focus behind this book on wafer bonding is the fast paced changes in the research and development in three-dimensional (3D) integration, temporary bonding and micro-electro-mechanical systems (MEMS) with new functional layers. Written by authors and edited by a team from microsystems companies and industry-near research organizations, this handbook and reference presents dependable, first-hand information on bonding technologies. Part I sorts the wafer bonding technologies into four categories: Adhesive and Anodic Bonding; Direct Wafer Bonding; Metal Bonding; and Hybrid Metal/Dielectric Bonding. Part II summarizes the key wafer bonding applications developed recently, that is, 3D integration, MEMS, and temporary bonding, to give readers a taste of the significant applications of wafer bonding technologies. This book is aimed at materials scientists, semiconductor physicists, the semiconductor industry, IT engineers, electrical engineers, and libraries.

2012
  • Language: en
  • Pages: 3064

2012

Particularly in the humanities and social sciences, festschrifts are a popular forum for discussion. The IJBF provides quick and easy general access to these important resources for scholars and students. The festschrifts are located in state and regional libraries and their bibliographic details are recorded. Since 1983, more than 659,000 articles from more than 30,500 festschrifts, published between 1977 and 2011, have been catalogued.

Diffusion in Condensed Matter
  • Language: en
  • Pages: 971

Diffusion in Condensed Matter

This comprehensive, handbook-style survey of diffusion in condensed matter gives detailed insight into diffusion as the process of particle transport due to stochastic movement. It is understood and presented as a phenomenon of crucial relevance for a large variety of processes and materials. In this book, all aspects of the theoretical fundamentals, experimental techniques, highlights of current developments and results for solids, liquids and interfaces are presented.

Wafer Bonding
  • Language: en
  • Pages: 510

Wafer Bonding

The topics include bonding-based fabrication methods of silicon-on-insulator, photonic crystals, VCSELs, SiGe-based FETs, MEMS together with hybrid integration and laser lift-off. The non-specialist will learn about the basics of wafer bonding and its various application areas, while the researcher in the field will find up-to-date information about this fast-moving area, including relevant patent information.

Silicon and Silicide Nanowires
  • Language: en
  • Pages: 472

Silicon and Silicide Nanowires

  • Type: Book
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  • Published: 2016-04-19
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  • Publisher: CRC Press

Nanoscale materials are showing great promise in various electronic, optoelectronic, and energy applications. Silicon (Si) has especially captured great attention as the leading material for microelectronic and nanoscale device applications. Recently, various silicides have garnered special attention for their pivotal role in Si device engineering

Semiconductor Wafer Bonding : Science, Technology, and Applications V
  • Language: en
  • Pages: 498
Electrochemistry
  • Language: en
  • Pages: 390

Electrochemistry

This volume is a key reference in the field of electrochemistry, allowing the reader to easily become acquainted with the latest research and opinion.

Molecular- and Nano-Tubes
  • Language: en
  • Pages: 477

Molecular- and Nano-Tubes

Molecular- and Nano-Tubes summarizes recent advancements in the synthesis, fabrication and applications of tubular structures. An interdisciplinary overview of innovative science focused on tubular structures is provided. The reader is offered an overview of the different fields that molecular and nano tubes appear in, in order to learn the fundamental basics as well as the applications of these materials. This book also: Shows how nanotechnology creates novel materials by crossing the barriers between biology and material science, electronics and optics, medicine and more Demonstrates that tubes are a fundamental element in nature and used in disparate applications such as ion channels and carbon nanotubes Molecular- and Nano-Tubes is an ideal volume for researchers and engineers working in materials science and nanotechnology.