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Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Learning the basics of physical chemistry with a unique, innovative approach. Georg Job and Regina Rueffler introduce readers to an almost intuitive understanding of the two fundamental concepts, chemical potential and entropy. Avoiding complex mathematics, these concepts are illustrated with the help of numerous demonstration experiments. Using these concepts, the subjects of chemical equilibria, kinetics and electrochemistry are presented at an undergraduate level. The basic quantities and equations necessary for the qualitative and quantitative description of chemical transformations are introduced by using everyday experiences and particularly more than one hundred illustrative experiments, many presented online as videos. These are in turn supplemented by nearly 400 figures, and by learning objectives for each chapter. From a review of the German edition: “This book is the most revolutionary textbook on physical chemistry that has been published in the last few decades.”
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar mate...
Electromagnetic metamaterials are a family of shaped periodic materials which achieve extraordinary scattering properties that are difficult or impossible to achieve with naturally occurring materials. This book focuses on one such feature of electromagnetic metamaterials—the theory, properties, and applications of the absorption of electromagnetic radiation. We have written this book for undergraduate and graduate students, researchers, and practitioners, covering the background and tools necessary to engage in the research and practice of metamaterial electromagnetic wave absorbers in various fundamental and applied settings. Given the growing impact of climate change, the call for innov...
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