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Handbook of Photomask Manufacturing Technology
  • Language: en
  • Pages: 730

Handbook of Photomask Manufacturing Technology

  • Type: Book
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  • Published: 2018-10-03
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  • Publisher: CRC Press

As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. Thes...

Handbook of VLSI Microlithography
  • Language: en
  • Pages: 1025

Handbook of VLSI Microlithography

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipmen...

The Physics of Submicron Lithography
  • Language: en
  • Pages: 502

The Physics of Submicron Lithography

This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.

Micro/Nanotribology and Its Applications
  • Language: en
  • Pages: 702

Micro/Nanotribology and Its Applications

Micro/nanotribology as a field is concerned with experimental and theoretical investigations of processes ranging from atomic and molecular scales to the microscale, occurring during adhesion, friction, wear, and thin-film lubrication at sliding surfaces. As a field it is truly interdisciplinary, but this confronts the would-be entrant with the difficulty of becoming familiar with the basic theories and applications: the area is not covered in any undergraduate or graduate scientific curriculum. The present work commences with a history of tribology and micro/nanotribology, followed by discussions of instrumentation, basic theories of friction, wear and lubrication on nano- to microscales, and their industrial applications. A variety of research instruments are covered, including a variety of scanning probe microscopes and surface force apparatus. Experimental research and modelling are expertly dealt with, the emphasis throughout being applied aspects.

Technology of Integrated Circuits
  • Language: en
  • Pages: 355

Technology of Integrated Circuits

This is the first book to comprehensively record the authors’ authoritative knowledge and practical experience of IC manufacturing, including the tremendous developments of recent years. With its strong application orientation, this is a must-have book for professionals in semiconductor industries.

Intelligent Energy Field Manufacturing
  • Language: en
  • Pages: 729

Intelligent Energy Field Manufacturing

  • Type: Book
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  • Published: 2018-10-03
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  • Publisher: CRC Press

Edited by prominent researchers and with contributions from experts in their individual areas, Intelligent Energy Field Manufacturing: Interdisciplinary Process Innovations explores a new philosophy of engineering. An in-depth introduction to Intelligent Energy Field Manufacturing (EFM), this book explores a fresh engineering methodology that not only integrates but goes beyond methodologies such as Design for Six Sigma, Lean Manufacturing, Concurrent Engineering, TRIZ, green and sustainable manufacturing, and more. This book gives a systematic introduction to classic non-mechanical manufacturing processes as well as offering big pictures of some technical frontiers in modern engineering. Th...

The Frontal Cortex
  • Language: en
  • Pages: 413

The Frontal Cortex

  • Type: Book
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  • Published: 2024-09-03
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  • Publisher: MIT Press

An in-depth investigation of the structure, neuronal mechanisms, and computations of the frontal lobe that enable higher-level thought. Experts from neurobiology, neuroanatomy, evolutionary biology, cognitive neuroscience, computational neuroscience, and clinical science examine how the neuronal structure of the frontal lobes enables unique aspects of higher-level thought. Implications for understanding disrupted function in neurological and psychiatric disorders, as well as societal issues, such as volitional control of behavior and educational practice, are also considered.

Finite Element Simulation of Residual Stresses from Welding and High Frequency Hammer Peening
  • Language: en
  • Pages: 316

Finite Element Simulation of Residual Stresses from Welding and High Frequency Hammer Peening

Research goal of the present monograph is the establishment of an efficient engineering approach, which will include straightforward but accurate simulation models, in order to estimate the residual stress fields of welded joints introduced during welding and their post-weld treatment with High Frequency Hammer Peening. The present subject lies on the intersection of structural engineering, material science and computational mechanics.

Publications Combined - Over 100 Studies In Nanotechnology With Medical, Military And Industrial Applications 2008-2017
  • Language: en
  • Pages: 7322

Publications Combined - Over 100 Studies In Nanotechnology With Medical, Military And Industrial Applications 2008-2017

Over 7,300 total pages ... Just a sample of the contents: Title : Multifunctional Nanotechnology Research Descriptive Note : Technical Report,01 Jan 2015,31 Jan 2016 Title : Preparation of Solvent-Dispersible Graphene and its Application to Nanocomposites Descriptive Note : Technical Report Title : Improvements To Micro Contact Performance And Reliability Descriptive Note : Technical Report Title : Delivery of Nanotethered Therapies to Brain Metastases of Primary Breast Cancer Using a Cellular Trojan Horse Descriptive Note : Technical Report,15 Sep 2013,14 Sep 2016 Title : Nanotechnology-Based Detection of Novel microRNAs for Early Diagnosis of Prostate Cancer Descriptive Note : Technical Re...

Emerging Technologies for In Situ Processing
  • Language: en
  • Pages: 286

Emerging Technologies for In Situ Processing

Proceedings of the NATO Advanced Research Workshop, Cargèse, France, May 4-8, 1987