Welcome to our book review site go-pdf.online!
You may have to Search all our reviewed books and magazines, click the sign up button below to create a free account.
Advanced Technologies Based on Wave and Beam Generated Plasmas
This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It lays a foundation for the application of sources in industry and various research areas
Guided-Wave-Produced Plasmas
Guided-Wave-Produced Plasmas provides an up-to-date report on the physics of plasmas produced by the high-frequency electromagnetic fields of guided waves. The modelling of discharges generated by travelling surface waves is presented using a unified approach based on modern aspects of nonlinear plasma theory. Diagnostic methods needed for research and the main experimental results on plasma behaviour are covered in detail. The methods and ideas presented are liekly to lead to a wide variety of applications in plasma technology.
High Density Plasma Sources
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
Plasma Processing of Semiconductors
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Fluorescent Proteins
This new edition of Fluorescent Proteins presents current applications of autofluorescent proteins in cell and molecular biology authored by researchers from many of the key laboratories in the field. Starting from a current review of the broad palette of fluorescent proteins available, several chapters focus on key autofluorescent protein variants, including spectral variants, photodynamic variants as well as chimeric FP approaches. Molecular applications are addressed in chapters that detail work with single molecules, approaches to generating protein fusions and biosensors as well as analysis of protein-protein interactions in vivo by FRET, fluorescence polarization and fluorescence cross...
Plasma Technology
The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gr...
Radiative Processes in Discharge Plasmas
An Advanced Study Institute on Radiative Processes in Discharge Plasmas was held at the Atholl Palace Hotel, Pitlochry, Perthshire, Scotland, June 23 through July 5, 1985. This publication is the Pro ceedings from that Institute. The Institute was attended by eighty-five Participants and Lecturers representing the United States, Canada, France, West Germany, Greece, The Netherlands, Portugal, Turkey, the United Kingdom, and Switzerland. A distinguished faculty of eighteen Lecturers was assembled and the topical program organized with the assistance of an Advisory Committee composed of: Dr. John Waymouth, USA; Dr. Timm Teich, Switzerland; Dr. Arthur Phelps, USA; Dr. Nicol Peacock, England; Pr...
Surface Electron Cyclotron Waves in Plasmas
This book is the first of its kind devoted to surface waves propagating across an external static magnetic field at harmonics of the electron cyclotron frequency. Based on comprehensive theoretical studies carried out over the course of about forty years, it presents unique material on various characteristics of these transverse waves, namely, dispersion properties and their dependence on numerous design peculiarities of plasma waveguides; damping due to interaction with the plasma surface (the kinetic channel) and collisions between plasma particles (the Ohmic channel); interaction with flows of charged particles moving above the plasma surface; parametric excitation due to the effect of an external radiofrequency field; and their power transfer for sustaining gas discharges. Clarifying numerous complicated mathematical issues it is a valuable resource for postgraduate students and experts in plasma physics, electromagnetic waves, and the kinetic theory of plasmas.
