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Ultraclean Surface Processing of Silicon Wafers
A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Recent Advances in Nanofabrication Techniques and Applications
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Mechatronics and Intelligent Materials II
Selected, peer reviewed papers from the 2012 International conference on Mechatronics and Intelligent Materials (MIM 2012), May 18-19, 2012, GuiLin, China
Applied Scanning Probe Methods VIII
The volumes VIII, IX and X examine the physical and technical foundation for recent progress in applied scanning probe techniques. This is the first book to summarize the state-of-the-art of this technique. The field is progressing so fast that there is a need for a set of volumes every 12 to 18 months to capture latest developments. These volumes constitute a timely comprehensive overview of SPM applications.
The Global Technology Revolution China, In-Depth Analyses
China's Tianjin Binhai New Area and the Tianjin Economic-Technological Development Area commissioned a technology-foresight study to help them plan for economic growth. The authors recommend seven emerging technology applications (TAs)--solar energy, mobile communications, rapid bioassays, new water-purification systems, molecular-scale drugs, electric and hybrid vehicles, and green manufacturing--and describe drivers, barriers, and plans for each.
Applied Scanning Probe Methods X
The volumes VIII, IX and X examine the physical and technical foundation for recent progress in applied scanning probe techniques. This is the first book to summarize the state-of-the-art of this technique. The field is progressing so fast that there is a need for a set of volumes every 12 to 18 months to capture latest developments. These volumes constitute a timely comprehensive overview of SPM applications.
Advances in Solid State Circuit Technologies
This book brings together contributions from experts in the fields to describe the current status of important topics in solid-state circuit technologies. It consists of 20 chapters which are grouped under the following categories: general information, circuits and devices, materials, and characterization techniques. These chapters have been written by renowned experts in the respective fields making this book valuable to the integrated circuits and materials science communities. It is intended for a diverse readership including electrical engineers and material scientists in the industry and academic institutions. Readers will be able to familiarize themselves with the latest technologies in the various fields.
Applied Scanning Probe Methods IX
The volumes VIII, IX and X examine the physical and technical foundation for recent progress in applied scanning probe techniques. This is the first book to summarize the state-of-the-art of this technique. The field is progressing so fast that there is a need for a set of volumes every 12 to 18 months to capture latest developments. These volumes constitute a timely and comprehensive overview of SPM applications.
Metropolitan Museum Studies in Art, Science, and Technology
This second volume of Studies in Art, Science, and Technology unites studies by scientists, curators, and conservators, all of which are published here for the first time. Essays and technical notes address a variety of themes, such as connections between technology and aesthetics, aging processes of artworks, attribution and dating issues, and conservation theory. Specific examples from throughout art history add context and help promote deeper understanding. A wide range of objects are discussed in the texts, including medieval sculptures, Baroque musical instruments, Egyptian stone works, photographs, enamels, and paintings. The refined analyses of these works will prove relevant and enlightening to an interdisciplinary professional audience.
