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Emerging Technologies for In Situ Processing
Proceedings of the NATO Advanced Research Workshop, Cargèse, France, May 4-8, 1987
Laser Processing and Chemistry
Laser Processing and Chemistry gives an overview of the fundamentals and applications of laser-matter interactions, in particular with regard to laser material processing. Special attention is given to laser-induced physical and chemical processes at gas-solid, liquid-solid, and solid-solid interfaces. Starting with the background physics, the book proceeds to examine applications of laser techniques in micro-machining, and the patterning, coating, and modification of material surfaces. This fourth edition has been revised and enlarged to cover new topics such as 3D microfabrication, advances in nanotechnology, ultrafast laser technology and laser chemical processing (LCP). Graduate students, physicists, chemists, engineers, and manufacturers alike will find this book an invaluable reference work on laser processing.
Pulsed Laser Ablation of Solids
The book introduces ‘the state of the art' of pulsed laser ablation and its applications. It is based on recent theoretical and experimental studies. The book reaches from the basics to advanced topics of pulsed laser ablation. Theoretical and experimental fundamental phenomena involved in pulsed laser ablation are discussed with respect to material properties, laser wavelength, fluence and intensity regime of the light absorbed linearly or non-linearly in the target material. The energy absorbed by the electrons leads to atom/molecule excitation, ionization and/or direct chemical bond breaking and is also transferred to the lattice leading to material heating and phase transitions. Experi...
Thin Film Processes II
This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Provides an all-new sequel to the 1978 classic, Thin Film Processes Introduces new topics, and several key topics presented in the original volume are updated Emphasizes practical applications of major thin film deposition and etching processes Helps readers find the appropriate technology for a particular application
Materials Instabilities
This book deals with the methods and concepts of nonlinear dynamics, pattern formation, bifurcation theory, irreversible thermodynamics, and their application to advanced materials science problems. The focus is on the effect of dynamical instabilities on materials behavior and properties. The book is addressed to physicists, chemists, mathematicians and engineers who wish to work in this domain, or to learn about its latest advances. It is also aimed at bridging gaps between science and technology. Contents:Physico-Chemical Thermodynamics of Material Systems: A Review of Basic Concepts and Results (A F Guillermet)Computational Methods for Mesoscopic, Inhomogeneous Plastic Deformation (N M G...
Photochemistry and Photophysics of Polymeric Materials
Presents the state of the technology, from fundamentals to new materials and applications Today's electronic devices, computers, solar cells, printing, imaging, copying, and recording technology, to name a few, all owe a debt to our growing understanding of the photophysics and photochemistry of polymeric materials. This book draws together, analyzes, and presents our current understanding of polymer photochemistry and photophysics. In addition to exploring materials, mechanisms, processes, and properties, the handbook also highlights the latest applications in the field and points to new developments on the horizon. Photochemistry and Photophysics of Polymer Materials is divided into sevent...
Reduced Thermal Processing for ULSI
As feature dimensions of integrated circuits shrink, the associated geometrical constraints on junction depth impose severe restrictions on the thermal budget for processing such devices. Furthermore, due to the relatively low melting point of the first aluminum metallization level, such restrictions extend to the fabrication of multilevel structures that are now essential in increasing packing density of interconnect lines. The fabrication of ultra large scale integrated (ULSI) devices under thermal budget restrictions requires the reassessment of existing and the development of new microelectronic materials and processes. This book addresses three broad but interrelated areas. The first ar...
Progress in Inorganic Chemistry, Volume 41
This comprehensive series of volumes on inorganic chemistry provides inorganic chemists with a forum for critical, authoritative evaluations of advances in every area of the discipline. Every volume reports recent progress with a significant, up-to-date selection of papers by internationally recognized researchers, complemented by detailed discussions and complete documentation. Each volume features a complete subject index and the series includes a cumulative index as well.
