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Characterization of Solid Surfaces
Until comparatively recently, trace analysis techniques were in general directed toward the determination of impurities in bulk materials. Methods were developed for very high relative sensitivity, and the values determined were average values. Sampling procedures were devised which eliminated the so-called sampling error. However, in the last decade or so, a number of developments have shown that, for many purposes, the distribution of defects within a material can confer important new properties on the material. Perhaps the most striking example of this is given by semiconductors; a whole new industry has emerged in barely twenty years based entirely on the controlled distribu tion of defe...
ARPA/NBS Workshop IV
None
Measurements for Competitiveness in Electronics
Identifies currently unmet measurement needs most critical for the U.S. electronics industry to compete successfully worldwide. Includes: role of measurements in competitiveness, & overview of U.S. electronics & electrical-equipment industries. Nine subfields of electronics are covered: semiconductors, magnetics, superconductors, microwaves, lasers, optical-fiber communications, optical-fiber sensors, video, & electromagnetic compatibility. Extensive references. Charts, tables & graphs.
Materials and Process Characterization
VLSI Electronics: Microstructure Science, Volume 6: Materials and Process Characterization addresses the problem of how to apply a broad range of sophisticated materials characterization tools to materials and processes used for development and production of very large scale integration (VLSI) electronics. This book discusses the various characterization techniques, such as Auger spectroscopy, secondary ion mass spectroscopy, X-ray topography, transmission electron microscopy, and spreading resistance. The systematic approach to the technologies of VLSI electronic materials and device manufacture are also considered. This volume is beneficial to materials scientists, chemists, and engineers who are commissioned with the responsibility of developing and implementing the production of materials and devices to support the VLSI era.
Encyclopedia of Chemical Processing and Design
Z-Factor (Gas Compressibility) to Errors Zone Refining
Silicon Device Processing
The objective of the Symposium was to provide an opportunity for engineers and applied scientists actively engaged in the silicon device technology field to discuss the most advanced measurement methods for process control and materials characterization.The basic theme of the meeting was to stress the interdependence of measurements techniques, facilities, and materials as they relate to the overall problems of improving and advancing silicon device sciences and technologies.(Author).
