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Oxide Thin Films and Nanostructures
  • Language: en
  • Pages: 346

Oxide Thin Films and Nanostructures

Nanostructured oxide materials - ultra-thin films, nanoparticles and other nanometer-scale objects - play prominent roles in many aspects of our every-day life, in nature and in technological applications, among which is the all-oxide electronics of tomorrow. Due to their reduced dimensions and dimensionality, they strongly interact with their environment: gaseous atmosphere, water or support. Their novel physical and chemical properties are the subject of this book, from both a fundamental and an applied perspective. Oxide Thin Films and Nanostructures reviews and illustrates the various methodologies for their growth, fabrication, experimental and theoretical characterization. The role of ...

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface--4, 2000
  • Language: en
  • Pages: 562

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface--4, 2000

  • Type: Book
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  • Published: 2000
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  • Publisher: Unknown

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ULSI Science and Technology/1997
  • Language: en
  • Pages: 686

ULSI Science and Technology/1997

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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface-3, 1996
  • Language: en
  • Pages: 804

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface-3, 1996

  • Type: Book
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  • Published: 1996
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  • Publisher: Unknown

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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface
  • Language: en
  • Pages: 543

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface

The properties of Si02 and the Si-Si02 interface provide the key foundation onto which the majority of semiconductor device technology has been built Their study has consumed countless hours of many hundreds of investigators over the years, not only in the field of semiconductor devices but also in ceramics, materials science, metallurgy, geology, and mineralogy, to name a few. These groups seldom have contact with each other even though they often investigate quite similar aspects of the Si02 system. Desiring to facilitate an interaction between these groups we set out to organize a symposium on the Physics and Chemistry of Si()z and the Si-Si()z Interface under the auspices of The Electroc...

Semiconductor Fabrication
  • Language: en
  • Pages: 472

Semiconductor Fabrication

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Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices
  • Language: en
  • Pages: 503

Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices

An extrapolation of ULSI scaling trends indicates that minimum feature sizes below 0.1 mu and gate thicknesses of Audience: Both expert scientists and engineers who wish to keep up with cutting edge research, and new students who wish to learn more about the exciting basic research issues relevant to next-generation device technology.

Rapid Thermal Processing
  • Language: en
  • Pages: 430

Rapid Thermal Processing

This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.

Silicon Nitride and Silicon Dioxide Thin Insulating Films
  • Language: en
  • Pages: 610

Silicon Nitride and Silicon Dioxide Thin Insulating Films

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Proceedings of the ... International Symposium on Semiconductor Wafer Bonding
  • Language: en
  • Pages: 524

Proceedings of the ... International Symposium on Semiconductor Wafer Bonding

  • Type: Book
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  • Published: 1991
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  • Publisher: Unknown

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