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SiGe--materials, Processing, and Devices
  • Language: en
  • Pages: 1242

SiGe--materials, Processing, and Devices

None

ULSI Process Integration
  • Language: en
  • Pages: 408

ULSI Process Integration

None

Silicon Materials Science and Technology
  • Language: en
  • Pages: 894

Silicon Materials Science and Technology

  • Type: Book
  • -
  • Published: 1998
  • -
  • Publisher: Unknown

None

Silicon Materials Science and Technology
  • Language: en
  • Pages: 894
ULSI Process Integration 5
  • Language: en
  • Pages: 509

ULSI Process Integration 5

The symposium provided a forum for reviewing and discussing all aspects of process integration, with special focus on nanoscaled technologies, 65 nm and beyond on DRAM, SRAM, flash memory, high density logic-low power, RF, mixed analog-digital, process integration yield, CMP chemistries, low-k processes, gate stacks, metal gates, rapid thermal processing, silicides, copper interconnects, carbon nanotubes, novel materials, high mobility substrates (SOI, sSi, SiGe, GeOI), strain engineering, and hybrid integration.

Scientific Information Bulletin
  • Language: en
  • Pages: 140

Scientific Information Bulletin

  • Type: Book
  • -
  • Published: 1989
  • -
  • Publisher: Unknown

None

SiGe, Ge, and Related Compounds 4: Materials, Processing, and Devices
  • Language: en
  • Pages: 1066

SiGe, Ge, and Related Compounds 4: Materials, Processing, and Devices

Advanced semiconductor technology is depending on innovation and less on "classical" scaling. SiGe, Ge, and Related Compounds has become a key component in the arsenal in improving semiconductor performance. This symposium discusses the technology to form these materials, process them, FET devices incorporating them, Surfaces and Interfaces, Optoelectronic devices, and HBT devices.

Plasma Etching Processes for Sub-quarter Micron Devices
  • Language: en
  • Pages: 396