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Thin Film Processes II
  • Language: en
  • Pages: 881

Thin Film Processes II

  • Type: Book
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  • Published: 2012-12-02
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  • Publisher: Elsevier

This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. - Provides an all-new sequel to the 1978 classic, Thin Film Processes - Introduces new topics, and several key topics presented in the original volume are updated - Emphasizes practical applications of major thin film deposition and etching processes - Helps readers find the appropriate technology for a particular application

Physico-Chemical Phenomena in Thin Films and at Solid Surfaces
  • Language: en
  • Pages: 800

Physico-Chemical Phenomena in Thin Films and at Solid Surfaces

  • Type: Book
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  • Published: 2007-06-07
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  • Publisher: Elsevier

The book is devoted to the consideration of the different processes taking place in thin films and at surfaces. Since the most important physico-chemical phenomena in such media are accompanied by the rearrangement of an intra- and intermolecular coordinates and consequently a surrounding molecular ensemble, the theory of radiationless multi-vibrational transitions is used for its description. The second part of the book considers the numerous surface phenomena. And in the third part is described the preparation methods and characteristics of different types of thin films. Both experimental and theoretical descriptions are represented. Media rearrangement coupled with the reagent transformat...

Cavity Polaritons
  • Language: en
  • Pages: 248

Cavity Polaritons

  • Type: Book
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  • Published: 2003-11-26
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  • Publisher: Elsevier

Volume 32 of the series addresses one of the most rapidly developing research fields in physics: microcavities. Microcavities form a base for fabrication of opto-electronic devices of XXI century, in particular polariton lasers based on a new physical principle with respect to conventional lasers proposed by Einstein in 1917. This book overviews a theory of all major phenomena linked microcavities and exciton-polaritons and is oriented to the reader having no background in solid state theory as well as to the advanced readers interested in theory of exciton-polaritons in microcavities. All major experimental discoveries in the field are addressed as well.·The book is oriented to a general r...

Non-Crystalline Films for Device Structures
  • Language: en
  • Pages: 279

Non-Crystalline Films for Device Structures

  • Type: Book
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  • Published: 2001-12-11
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  • Publisher: Elsevier

Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Volume 29 consists of chapters pulled from Hari Singh Nalwa's forthcoming Handbook of Thin Film Materials (ISBN: 0-12-512908-4). The chapters were selected because they deal exclusively with amorphous film structures and because they have a common relevance to semiconductor, or electronic, devices and circuits. These are subjects not yet stressed in the Thin Films series.

Frontiers of Thin Film Technology
  • Language: en
  • Pages: 495

Frontiers of Thin Film Technology

Frontiers of Thin Film Technology, Volume 28 focuses on recent developments in those technologies that are critical to the successful growth, fabrication, and characterization of newly emerging solid-state thin film device architectures. Volume 28 is a condensed sampler of the Handbook for use by professional scientists, engineers, and students involved in the materials, design, fabrication, diagnostics, and measurement aspects of these important new devices.

Advances in Plasma-Grown Hydrogenated Films
  • Language: en
  • Pages: 293

Advances in Plasma-Grown Hydrogenated Films

  • Type: Book
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  • Published: 2001-12-12
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  • Publisher: Elsevier

Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Starting with Volume 30, the title of the series, Thin Films, is being changed to Thin Films and Nanostructures. We feel that this new titlereflects more accurately the rapidly growing inclusion of research anddevelopment efforts on nanostructures, especially in relation to novel solid-state device formats

The Foundations of Vacuum Coating Technology
  • Language: en
  • Pages: 164

The Foundations of Vacuum Coating Technology

Annotation applications of this technology. With its many references, this book provides a starting point for more in-depth surveys on what has been done as well as more recent work. The author draws comparisons and places the information in the proper context, which is particularly helpful for the patent literature where the terminology used is often not that used by the technical community. A "must" for materials scientists and engineers working with vacuum coating in the invention of new applications and researching patents, plus of special interest to those in the semiconductors field.

Thin Film Processes
  • Language: en
  • Pages: 577

Thin Film Processes

  • Type: Book
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  • Published: 2012-12-02
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  • Publisher: Elsevier

Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process.

Electronic Excitations in Organic Based Nanostructures
  • Language: en
  • Pages: 509

Electronic Excitations in Organic Based Nanostructures

  • Type: Book
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  • Published: 2003-11-13
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  • Publisher: Elsevier

The first book devoted to a systematic consideration of electronic excitations and electronic energy transfer in organic crystalline multilayers and organics based nanostructures(quantum wells, quantum wires, quantum dots, microcavities). The ingenious combination of organic with inorganic materials in one and the same hybrid structure is shown to give qualitatively new opto-electronic phenomena, potentially important for applications in nonlinear optics, light emitting devices, photovoltaic cells, lasers and so on. The book will be useful not only for physicists but also for chemists and biologists.To help the nonspecialist reader, three Chapters which contain a tutorial and updated introduction to the physics of electronic excitations in organic and inorganic solids have been included.* hybrid Frenkel-Wannier-Mott excitons* microcavities with crystalline and disordered organics * electronic excitation at donor-acceptor interfaces * cold photoconductivity at donor-acceptor interface* cummulative photovoltage* Feorster transfer energy in microcavity* New concepts for LEDs

Ionized Physical Vapor Deposition
  • Language: en
  • Pages: 268

Ionized Physical Vapor Deposition

This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD...