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In this third edition, more than 40 renowned authorities introduce and update chapters on the theory, fundamentals, techniques, and instrumentation of thin-layer chromatography (TLC) and high-performance thin-layer chromatography (HPTLC), highlighting the latest procedures and applications of TLC to 19 important compound classes and coverage of TLC applications by compound type. Easily adaptable to industrial scenarios , the Handbook of Thin-Layer Chromatography, Third Edition supports practical research strategies with extensive tables of data, offers numerous figures that illustrate techniques and chromatograms, and includes a glossary as well as a directory of equipment suppliers.
These are the Proceedings of Colloquium No. 153 of the International Astro nomical Union, held at Makuhari near Tokyo on May 22 - 26, 1995, and hosted by the National Astronomical Observatory. This meeting was intended to be an interdisciplinary meeting between re searchers of solar and stellar activity, in order for them to exchange the newest information in each field. While each of these areas has seen remarkable advances in recent years, and while the researchers in each field have felt that information from the other's domain would be extremely useful in their own work, there have not been very many opportunities for intensive exchanges of information between these closely related field...
Reviews the most interesting materials on the market concerning self-ordering, including macroporous silicon, porous alumina, MCM41 and photonic bandgap.
A comprehensive review of recent medicinal chemistry approaches to a variety of important therapeutic targets and a key reference for those interested in the prosecution of modern drug discovery programs directed at anti-inflammatory mechanisms of action.
The 22nd International Free Electron Laser Conference and 7th FEL User Workshop were held August 13-18, 2000 at Washington Duke Inn and Golf Club in Durham, North Carolina, USA. The conference and the workshop were hosted by Duke University's Free Electron laser (FEL) Laboratory. Following tradition, the FEL prize award was announced at the banquet. The year 2000 FEL prize was awarded to three scientists propelling the limits of high power FELs: Steven Benson, Eisuke Minehara and George Neill. The conference program was comprised of traditional oral sessions on First Lasing, FEL theory, storage ring FELs, linac and high power FELs, long wavelength FELs, SASE FELs, accelerator and FEL physics...
Vols. for 1963- include as pt. 2 of the Jan. issue: Medical subject headings.
This state-of-the-art volume offers a comprehensive and accessible examination of perspectives within the field of discourse analysis on the processes and conditions of second language learning, teaching, and use. Led by Brian Paltridge and Matthew T. Prior, this collection brings together leading global researchers in the field to guide readers through background theories, theoretical paradigms, methodological issues, and pedagogical implications by synthesizing current and past work, and setting a future agenda for discourse-oriented second language research. The book is a critical resource which will be indispensable for scholars and advanced students of applied linguistics, second language acquisition, education, and related fields.
Advances in Catalysis
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.