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Comprehensive Inorganic Chemistry II, Nine Volume Set reviews and examines topics of relevance to today’s inorganic chemists. Covering more interdisciplinary and high impact areas, Comprehensive Inorganic Chemistry II includes biological inorganic chemistry, solid state chemistry, materials chemistry, and nanoscience. The work is designed to follow on, with a different viewpoint and format, from our 1973 work, Comprehensive Inorganic Chemistry, edited by Bailar, Emeléus, Nyholm, and Trotman-Dickenson, which has received over 2,000 citations. The new work will also complement other recent Elsevier works in this area, Comprehensive Coordination Chemistry and Comprehensive Organometallic Che...
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The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Conte...
Low temperature processes for semiconductors have been recently under intensive development to fabricate controlled device structures with minute dimensions in order to achieve the highest device performance and new device functions as well as high integration density. Comprising reviews by experts long involved in the respective pioneering work, this volume makes a useful contribution toward maturing the process of low temperature epitaxy as a whole.
This book reflects the state of the art in the field of photoprocessing. In addition to providing an introduction and review of many key areas of interest, it targets potential future applications of the technique, and realistically discusses problems that have yet to be solved. The individual chapters have been written by internationally recognized experts and the combination provides a unique and knowledgeable text. Although the basic scientific fundamentals are briefly addressed, the volume concentrates strongly on applications and as such should appeal to applied research scientists as well as students and engineers in the field, and those in managerial or funding positions in technology. Topics include: UV lens design Laser lithography Photonucleation Excimer laser development Processors for direct writing Laser ablation (polymers and superconductors) Laser doping, etching, deposition, and growth
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