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Response of Insects to Damaged and Undamaged Germinating Acorns
  • Language: en
  • Pages: 8

Response of Insects to Damaged and Undamaged Germinating Acorns

  • Type: Book
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  • Published: 1991
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  • Publisher: Unknown

S2Damaged germinating northern red oak, Quercus rubra L., acorns in pitfall traps were significantly more attractive to two species of acorn insects than undamaged germinating acorns. Significantly more adults of the weevil Conotrachelus posticatus Boheman and the sap beetle Stelidota octomaculata (Say) were caught in traps containing germinating acorns cut into halves versus traps containing uncut, germinating acorns. Larvae of the acorn moth Valentinia glandulella (Riley) also preferred damaged over undamaged acorns, but few larvae were caught and the results were not analyzed. S3.

High Density Plasma Sources
  • Language: en
  • Pages: 467

High Density Plasma Sources

  • Type: Book
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  • Published: 1996-12-31
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  • Publisher: Elsevier

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

Research Paper NE
  • Language: en
  • Pages: 8

Research Paper NE

  • Type: Book
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  • Published: 1987
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  • Publisher: Unknown

None

Handbook of Refractory Carbides and Nitrides
  • Language: en
  • Pages: 363

Handbook of Refractory Carbides and Nitrides

Refractory carbides and nitrides are useful materials with numerous industrial applications and a promising future, in addition to being materials of great interest to the scientific community. Although most of their applications are recent, the refractory carbides and nitrides have been known for over one hundred years. The industrial importance of the refractory carbides and nitrides is growing rapidly, not only in the traditional and well-established applications based on the strength and refractory nature of these materials such as cutting tools and abrasives, but also in new and promising fields such as electronics and optoelectronics.

Handbook of Vacuum Arc Science & Technology
  • Language: en
  • Pages: 775

Handbook of Vacuum Arc Science & Technology

This is a comprehensive text describing the basic physics and technological applications of vacuum arcs. Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant interelectrode plasma. Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.

Guide to the Stand-damage Model Interface Management System
  • Language: en
  • Pages: 302

Guide to the Stand-damage Model Interface Management System

  • Type: Book
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  • Published: 1995
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  • Publisher: Unknown

None

Ultra-Fine Particles
  • Language: en
  • Pages: 469

Ultra-Fine Particles

  • Type: Book
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  • Published: 1995-12-31
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  • Publisher: Elsevier

This book was written with several objectives in mind: 1. To share with as many scientists and engineers as possible the intriguing scientific aspects of ultra-fine particles (UFPs) and to show their potential as new materials. 2. Entice such researchers to participate in the development of this emerging field. 3. To publicize the achievements of the Ultra-Fine Particle Project, which was carried out under the auspices of the Exploratory Research for Advanced Technology program (ERATO). In addition to the members of the Ultra-Fine Particle Project, contributions from other pioneers in this field are included. To achieve the first objective described above, the uniformity of the contents and focus on a single central theme have been sacrificed somewhat to provide a broad coverage. It is expected that the reader can discover an appropriate topic for further development of new materials and basic technology by reading selected sections of this book. Alternately, one may gain an overview of this new field by reviewing the entire book, which can potentially lead to new directions in the development of UFPs.

Air Force Register
  • Language: en
  • Pages: 1180

Air Force Register

  • Type: Book
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  • Published: 1963
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  • Publisher: Unknown

None

Diamond Chemical Vapor Deposition
  • Language: en
  • Pages: 207

Diamond Chemical Vapor Deposition

  • Type: Book
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  • Published: 1996-12-31
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  • Publisher: Elsevier

This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experiences researchers, scientists, and engineers in academia and industry with the latest developments in this growing field.