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Computer Simulation of Ion-Solid Interactions
In this book the author discusses the investigation of ion bombardment of solids by computer simulation, with the aim of demonstrating the usefulness of this approach to the problem of interactions of ions with solids. The various chapters present the basic physics behind the simulation programs, their structure and many applications to different topics. The two main streams, the binary collision model and the classical dynamics model, are discussed, as are interaction potentials and electronic energy losses. The main topics investigated are backscattering, sputtering and implantation for incident atomic particles with energies from the eV to the MeV range. An extensive overview of the literature is given, making this book of interest to the active reseacher as well to students entering the field.
Sputtering by Particle Bombardment
This book provides a long-needed survey of new results. Especially welcome is a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields, which is useful for researchers who need sputtering yields for physics research or applied problems. The book offers a critical review of computational methods for calculating sputtering yields and also includes molecular dynamics calculations.
Maximum Entropy and Bayesian Methods Garching, Germany 1998
In 1978 Edwin T. Jaynes and Myron Tribus initiated a series of workshops to exchange ideas and recent developments in technical aspects and applications of Bayesian probability theory. The first workshop was held at the University of Wyoming in 1981 organized by C.R. Smith and W.T. Grandy. Due to its success, the workshop was held annually during the last 18 years. Over the years, the emphasis of the workshop shifted gradually from fundamental concepts of Bayesian probability theory to increasingly realistic and challenging applications. The 18th international workshop on Maximum Entropy and Bayesian Methods was held in Garching / Munich (Germany) (27-31. July 1998). Opening lectures by G. L...
Economic Development and Social Change in the People’s Republic of China
It is a pleasant task to welcome the appearance of the American edition of Professor Willy Kraus' valuable work on the economic and social development of the People's Republic of China, first published in German in 1979. The book has been updated in the light of the events that have occurred since the original publication and incorporates the latest statistical information made available by the Chinese authorities with unaccus tomed liberality. The American edition, like its German predecessor, is a monumental achievement of scholarship, attractively presented. In its comprehensiveness, insight, professionalism and wisdom it ranks among the best studies of the subject. It will add to the kno...
Intelligent Autonomous Systems
This book contains scientific and engineering activities of the fifth international conference of Intelligent Autonomous Systems (IAS-5). The exploration for automatic systems has much attention over the centuries and created attractive research activities. The Intelligent and Autonomous systems are the current trend toward fully automatic systems that can adapt to changes in their environment. The purpose of the fifth IAS conference is to provide an opportunity for the international community of researchers in the field of autonomous systems as well as architectures, tools, components, techniques, and new IAS design methodologies. The emphasis will be on science and technology for autonomous systems working in a complex environment.
Advances in Machine Vision
This book describes recent strategies and applications for extracting useful information from sensor data. For example, the methods presented by Roth and Levine are becoming widely accepted as the ?best? way to segment range images, and the neural network methods for Alpha-numeric character recognition, presented by K Yamada, are believed to be the best yet presented. An applied system to analyze the images of dental imprints presented by J Ct, et al. is one of several examples of image processing systems that have already been proven to be practical, and can serve as a model for the image processing system designer. Important aspects of the automation of processes are presented in a practical way which can provide immediate new capabilities in fields as diverse as biomedical image processing, document processing, industrial automation, understanding human perception, and the defence industries. The book is organized into sections describing Model Driven Feature Extraction, Data Driven Feature Extraction, Neural Networks, Model Building, and Applications.
Sputtering by Particle Bombardment
This book provides a long-needed survey of new results. Especially welcome is a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields, which is useful for researchers who need sputtering yields for physics research or applied problems. The book offers a critical review of computational methods for calculating sputtering yields and also includes molecular dynamics calculations.
Automatic Extraction of Man-Made Objects from Aerial and Space Images (II)
Advancements in digital sensor technology, digital image analysis techniques, as well as computer software and hardware have brought together the fields of computer vision and photogrammetry, which are now converging towards sharing, to a great extent, objectives and algorithms. The potential for mutual benefits by the close collaboration and interaction of these two disciplines is great, as photogrammetric know-how can be aided by the most recent image analysis developments in computer vision, while modern quantitative photogrammetric approaches can support computer vision activities. Devising methodologies for automating the extraction of man-made objects (e.g. buildings, roads) from digit...
EUV Sources for Lithography
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
