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The study of semiconductor-layer structures using infrared ellipsometry is a rapidly growing field within optical spectroscopy. This book offers basic insights into the concepts of phonons, plasmons and polaritons, and the infrared dielectric function of semiconductors in layered structures. It describes how strain, composition, and the state of the atomic order within complex layer structures of multinary alloys can be determined from an infrared ellipsometry examination. Special emphasis is given to free-charge-carrier properties, and magneto-optical effects. A broad range of experimental examples are described, including multinary alloys of zincblende and wurtzite structure semiconductor materials, and future applications such as organic layer structures and highly correlated electron systems are proposed.
The Handbook of Ellipsometry is a critical foundation text on an increasingly critical subject. Ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research. Ellipsometry does not contact or damage samples, and is an ideal measurement technique for determining optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications now occurring, this book provides an essential foundation for the current science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, biotechnology, and pharmaceuticals. Divided into four parts, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas. Experts in the field contributed to its twelve chapters, covering various aspects of ellipsometry.
This new edition provides a state-of-the-art survey of ellipsometric methods used to study organic films and surfaces, from laboratory to synchrotron applications, with a special focus on in-situ use in processing environments and at solid-liquid interfaces. Thanks to the development of functional organic, meta- and hybrid materials for new optical, electronic, sensing and biotechnological devices, the ellipsometric analysis of optical and material properties has made tremendous strides over the past few years. The second edition has been updated to reflect the latest advances in ellipsometric methods. The new content focuses on the study of anisotropic materials, conjugated polymers, polarons, self-assembled monolayers, industrial membranes, adsorption of proteins, enzymes and RGD-peptides, as well as the correlation of ellipsometric spectra to structure and molecular interactions.
This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.
This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.
The contributions of leading international experts assembled in this volume provide an authoritative description of current research in the highly topical area of the optical properties of semiconductor structures in the nanometer range. .
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