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Handbook of Algorithms for Physical Design Automation
The physical design flow of any project depends upon the size of the design, the technology, the number of designers, the clock frequency, and the time to do the design. As technology advances and design-styles change, physical design flows are constantly reinvented as traditional phases are removed and new ones are added to accommodate changes in technology. Handbook of Algorithms for Physical Design Automation provides a detailed overview of VLSI physical design automation, emphasizing state-of-the-art techniques, trends and improvements that have emerged during the previous decade. After a brief introduction to the modern physical design problem, basic algorithmic techniques, and partitio...
Computer Vision – ECCV 2020
The 30-volume set, comprising the LNCS books 12346 until 12375, constitutes the refereed proceedings of the 16th European Conference on Computer Vision, ECCV 2020, which was planned to be held in Glasgow, UK, during August 23-28, 2020. The conference was held virtually due to the COVID-19 pandemic. The 1360 revised papers presented in these proceedings were carefully reviewed and selected from a total of 5025 submissions. The papers deal with topics such as computer vision; machine learning; deep neural networks; reinforcement learning; object recognition; image classification; image processing; object detection; semantic segmentation; human pose estimation; 3d reconstruction; stereo vision; computational photography; neural networks; image coding; image reconstruction; object recognition; motion estimation.
Advances in Organic Crystal Chemistry
For the last decade, the topics of organic crystal chemistry have become diversified, and each topic has been substantially advanced in concert with the rapid development of various analytical and measurement techniques for solid-state organic materials. The aim of this book is to systematically summarize and record the recent notable advances in various topics of organic crystal chemistry involving liquid crystals and organic–inorganic hybrid materials that have been achieved mainly in the last 5 years or so. The authors are invited members of the Division of Organic Crystals, The Chemical Society of Japan (CSJ), and prominent invited experts from abroad. This edited volume is planned to be published periodically, at least every 5 years, with contributions by prominent authors in Japan and from abroad.
Modern Circuit Placement
This book covers advanced techniques in modern circuit placement. It details all of most recent placement techniques available in the field and analyzes the optimality of these techniques. Coverage includes all the academic placement tools that competed against one another on the same industrial benchmark circuits at the International Symposium on Physical Design (ISPD), these techniques are also extensively being used in industrial tools as well. The book provides significant amounts of analysis on each technique such as trade-offs between quality-of-results (QoR) and runtime.
Machine Learning Applications in Electronic Design Automation
This book serves as a single-source reference to key machine learning (ML) applications and methods in digital and analog design and verification. Experts from academia and industry cover a wide range of the latest research on ML applications in electronic design automation (EDA), including analysis and optimization of digital design, analysis and optimization of analog design, as well as functional verification, FPGA and system level designs, design for manufacturing (DFM), and design space exploration. The authors also cover key ML methods such as classical ML, deep learning models such as convolutional neural networks (CNNs), graph neural networks (GNNs), generative adversarial networks (GANs) and optimization methods such as reinforcement learning (RL) and Bayesian optimization (BO). All of these topics are valuable to chip designers and EDA developers and researchers working in digital and analog designs and verification.
Design for Manufacturability with Advanced Lithography
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
A Synergistic Framework for Hardware IP Privacy and Integrity Protection
This book proposes a synergistic framework to help IP vendors to protect hardware IP privacy and integrity from design, optimization, and evaluation perspectives. The proposed framework consists of five interacting components that directly target at the primary IP violations. All the five algorithms are developed based on rigorous mathematical modeling for primary IP violations and focus on different stages of IC design, which can be combined to provide a formal security guarantee.
Stroke Genomics
With sequencing of the human genome now complete, deciphering the role of gene function in human neurological pathophysiology is a promise that has yet to be realized. More than most diseases, stroke has been keenly studied from a genomic perspective. Studies are numerous and incorporate data on stroke inheritance, chromosomal loci of risk, preclinical models of stroke, and differential gene expression of brain injury, repair, and recovery. The problem is no longer a lack of information but one of interpretation and prioritization of what we do know. The aims of Stroke Genomics: Methods and Reviews are twofold. First, it aims to provide the reader with cutting-edge reviews of clinical and pr...
Manufacturability Aware Routing in Nanometer VLSI
This paper surveys key research challenges and recent results of manufacturability aware routing in nanometer VLSI designs. The manufacturing challenges have their root causes from various integrated circuit (IC) manufacturing processes and steps, e.g., deep sub-wavelength lithography, random defects, via voids, chemical-mechanical polishing, and antenna-effects. They may result in both functional and parametric yield losses. The manufacturability aware routing can be performed at different routing stages including global routing, track routing, and detail routing, guided by both manufacturing process models and manufacturing-friendly rules. The manufacturability/yield optimization can be performed through both correct-by-construction (i.e., optimization during routing) as well as construct-by-correction (i.e., post-routing optimization). This paper will provide a holistic view of key design for manufacturability issues in nanometer VLSI routing.
Layout Optimization in VLSI Design
Introduction The exponential scaling of feature sizes in semiconductor technologies has side-effects on layout optimization, related to effects such as inter connect delay, noise and crosstalk, signal integrity, parasitics effects, and power dissipation, that invalidate the assumptions that form the basis of previous design methodologies and tools. This book is intended to sample the most important, contemporary, and advanced layout opti mization problems emerging with the advent of very deep submicron technologies in semiconductor processing. We hope that it will stimulate more people to perform research that leads to advances in the design and development of more efficient, effective, and ...
