You may have to Search all our reviewed books and magazines, click the sign up button below to create a free account.
This comprehensive text provides an understanding of the physical phenomenon behind electrooptics. It describes in detail modern electrooptic materials and operative physical mechanisms, and devotes a full chapter tothe new materials engineering that is contributing to the development of low-dimensional systems. The book also reviews device applications in both bulk and waveguide technologies. Provides extensive coverage in a self-contained format, and consequently useful to beginners as well as specialists Includes the most current information Features many tables and illustrations to facilitate understanding
This review volume presents new developments in the preparation, physical characterization and applications of insulating materials for Optoelectronics. Insulators occupy a leading position as laser and optical amplifier hosts, electrooptic and acoustooptic modulators, frequency doublers and optical parametric oscillators, photorefractive devices and radiator detectors. These applications rely heavily on the development of advanced techniques for the preparation of both bulk and waveguide structures, the adequate knowledge of the microscopic behaviour defects, impurities and a thorough understanding of their response to electromagnetic fields. All these topics relating basic physicochemical aspects and applied performance are authoritatively discussed in the book.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Ion implantation presents a continuously evolving technology. While the benefits of ion implantation are well recognized for many commercial endeavors, there have been recent developments in this field. Improvements in equipment, understanding of beam-solid interactions, applications to new materials, improved characterization techniques, and more recent developments to use implantation for nanostructure formation point to new directions for ion implantation and are presented in this book.
None