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Molecular Beam Epitaxy
  • Language: en
  • Pages: 795

Molecular Beam Epitaxy

  • Type: Book
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  • Published: 1995-12-31
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  • Publisher: Elsevier

In this volume, the editor and contributors describe the use of molecular beam epitaxy (MBE) for a range of key materials systems that are of interest for both technological and fundamental reasons. Prior books on MBE have provided an introduction to the basic concepts and techniques of MBE and emphasize growth and characterization of GaAs-based structures. The aim in this book is somewhat different; it is to demonstrate the versatility of the technique by showing how it can be utilized to prepare and explore a range of distinct and diverse materials. For each of these materials systems MBE has played a key role both in their development and application to devices.

Magnetism and Structure in Systems of Reduced Dimension
  • Language: en
  • Pages: 504

Magnetism and Structure in Systems of Reduced Dimension

This volume contains the papers presented at the NATO Advanced Research Workshop on "Magnetism and Structure in Systems of Reduced Dimension", held at l'Institut d'Etudes Scientifiques de Cargese - U.M.S. - C.N.R.S. - Universite de Corte Universite de Nice Sophia - Antipolis during June 15-19, 1992. The ordering of papers in the volume reflects the sequence of papers presented at the workshop. The aim was not to segregate the papers into rigidly defmed areas but to group the papers into small clusters, each cluster having a common theme. In this way the parallel, rather than serial, development of areas such as preparation of films, magnetic and structural characterization was highlighted. I...

Vacuum Deposition onto Webs, Films, and Foils
  • Language: en
  • Pages: 497

Vacuum Deposition onto Webs, Films, and Foils

This new book from William Andrew Publishing is the only practical reference available for anyone employing the roll-to-roll deposition process. Vacuum Deposition onto Webs, Films and Foils is an expansive journey of the process; benefiting manufacturing efficiency, unit cost reduction, and financial results. It is a sweeping approach to the total design of the vacuum deposition process written by a successful and world renowned consultant with three decades of experience.Roll-to-roll deposition processing is a high growth industry and this reference covers a wide variety of important industrial products that use vacuum deposited coatings, including: optical storage devices, metallized packa...

Handbook of Silicon Wafer Cleaning Technology
  • Language: en
  • Pages: 749

Handbook of Silicon Wafer Cleaning Technology

The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cle...

Diamond Chemical Vapor Deposition
  • Language: en
  • Pages: 207

Diamond Chemical Vapor Deposition

  • Type: Book
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  • Published: 1996-12-31
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  • Publisher: Elsevier

This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experiences researchers, scientists, and engineers in academia and industry with the latest developments in this growing field.

Official Gazette of the United States Patent and Trademark Office
  • Language: en
  • Pages: 476

Official Gazette of the United States Patent and Trademark Office

  • Type: Book
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  • Published: 1985
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  • Publisher: Unknown

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High Density Plasma Sources
  • Language: en
  • Pages: 467

High Density Plasma Sources

  • Type: Book
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  • Published: 1996-12-31
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  • Publisher: Elsevier

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

Handbook of Compound Semiconductors
  • Language: en
  • Pages: 937

Handbook of Compound Semiconductors

This book reviews the recent advances and current technologies used to produce microelectronic and optoelectronic devices from compound semiconductors. It provides a complete overview of the technologies necessary to grow bulk single-crystal substrates, grow hetero-or homoepitaxial films, and process advanced devices such as HBT's, QW diode lasers, etc.

Handbook of Magneto-Optical Data Recording
  • Language: en
  • Pages: 967

Handbook of Magneto-Optical Data Recording

  • Type: Book
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  • Published: 1995-12-31
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  • Publisher: Elsevier

This handbook brings together in a single volume expert contributions on the many aspects of MO data recording, including the materials in use, techniques for achieving recording function, and storage device subsystems. As a multiple author treatment, it brings perspective from many viewpoints and institutions. The insights delivered should be valuable to a wide audience from students to practitioners in all areas of information storage.

Handbook of Vacuum Arc Science & Technology
  • Language: en
  • Pages: 775

Handbook of Vacuum Arc Science & Technology

This is a comprehensive text describing the basic physics and technological applications of vacuum arcs. Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant interelectrode plasma. Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.