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Chemical Mechanical Planarization of Microelectronic Materials
  • Language: en
  • Pages: 337

Chemical Mechanical Planarization of Microelectronic Materials

Chemical Mechanical Planarization (CMP) plays an important role in today's microelectronics industry. With its ability to achieve global planarization, its universality (material insensitivity), its applicability to multimaterial surfaces, and its relative cost-effectiveness, CMP is the ideal planarizing medium for the interlayered dielectrics and metal films used in silicon integrated circuit fabrication. But although the past decade has seen unprecedented research and development into CMP, there has been no single-source reference to this rapidly emerging technology-until now. Chemical Mechanical Planarization of Microelectronic Materials provides engineers and scientists working in the mi...

Silicides for VLSI Applications
  • Language: en
  • Pages: 213

Silicides for VLSI Applications

Most of the subject matter of this book has previously been available only in the form of research papers and review articles. I have not attempted to refer to all the published papers. The reader may find it advantageous to refer to the references listed.

Diffusion Processes in Advanced Technological Materials
  • Language: en
  • Pages: 552

Diffusion Processes in Advanced Technological Materials

This new game book for understanding atoms at play aims to document diffusion processes and various other properties operative in advanced technological materials. Diffusion in functional organic chemicals, polymers, granular materials, complex oxides, metallic glasses, and quasi-crystals among other advanced materials is a highly interactive and synergic phenomenon. A large variety of atomic arrangements are possible. Each arrangement affects the performance of these advanced, polycrystalline multiphase materials used in photonics, MEMS, electronics, and other applications of current and developing interest. This book is written by pioneers in industry and academia for engineers, chemists, and physicists in industry and academia at the forefront of today's challenges in nanotechnology, surface science, materials science, and semiconductors.

Official Gazette of the United States Patent and Trademark Office
  • Language: en
  • Pages: 1498

Official Gazette of the United States Patent and Trademark Office

  • Type: Book
  • -
  • Published: 2002
  • -
  • Publisher: Unknown

None

Ceramic Materials and Components for Engines
  • Language: en
  • Pages: 678

Ceramic Materials and Components for Engines

Several ceramic parts have already proven their suitability for serial application in automobile engines in very impressive ways, especially in Japan, the USA and in Germany. However, there is still a lack of economical quality assurance concepts. Recently, a new generation of ceramic components, for the use in energy, transportation and environment systems, has been developed. The efforts are more and more system oriented in this field. The only possibility to manage this complex issue in the future will be interdisciplinary cooperation. Chemists, physicists, material scientists, process engineers, mechanical engineers and engine manufacturers will have to cooperate in a more intensive way ...

Microtech 2000 Workshop Report
  • Language: en
  • Pages: 58

Microtech 2000 Workshop Report

Graphs.

Semiconductor Silicon
  • Language: en
  • Pages: 1144

Semiconductor Silicon

  • Type: Book
  • -
  • Published: 1986
  • -
  • Publisher: Unknown

None

Official Gazette of the United States Patent and Trademark Office
  • Language: en
  • Pages: 1476

Official Gazette of the United States Patent and Trademark Office

  • Type: Book
  • -
  • Published: 2001
  • -
  • Publisher: Unknown

None

Electrochemical Processes in ULSI and MEMS
  • Language: en
  • Pages: 494

Electrochemical Processes in ULSI and MEMS

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