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Semiconductor Material and Device Characterization
  • Language: en
  • Pages: 800

Semiconductor Material and Device Characterization

This Third Edition updates a landmark text with the latest findings The Third Edition of the internationally lauded Semiconductor Material and Device Characterization brings the text fully up-to-date with the latest developments in the field and includes new pedagogical tools to assist readers. Not only does the Third Edition set forth all the latest measurement techniques, but it also examines new interpretations and new applications of existing techniques. Semiconductor Material and Device Characterization remains the sole text dedicated to characterization techniques for measuring semiconductor materials and devices. Coverage includes the full range of electrical and optical characterizat...

Advanced MOS Devices
  • Language: en
  • Pages: 268

Advanced MOS Devices

Pulls together all the relevant concepts in this field. Volume 5 builds upon the material previously covered in the series and contains references for further reading. For advanced students, industrial researchers and E.E. professionals.

Metal-Semiconductor Schottky Barrier Junctions and Their Applications
  • Language: en
  • Pages: 379

Metal-Semiconductor Schottky Barrier Junctions and Their Applications

The present-day semiconductor technology would be inconceivable without extensive use of Schottky barrier junctions. In spite of an excellent book by Professor E.H. Rhoderick (1978) dealing with the basic principles of metal semiconductor contacts and a few recent review articles, the need for a monograph on "Metal-Semiconductor Schottky Barrier Junctions and Their Applications" has long been felt by students, researchers, and technologists. It was in this context that the idea of publishing such a monograph by Mr. Ellis H. Rosenberg, Senior Editor, Plenum Publishing Corporation, was considered very timely. Due to the numerous and varied applications of Schottky barrier junctions, the task of bringing it out, however, looked difficult in the beginning. After discussions at various levels, it was deemed appropriate to include only those typical applications which were extremely rich in R&D and still posed many challenges so that it could be brought out in the stipulated time frame. Keeping in view the larger interest, it was also considered necessary to have the different topics of Schottky barrier junctions written by experts.

Handbook of Semiconductor Manufacturing Technology
  • Language: en
  • Pages: 1722

Handbook of Semiconductor Manufacturing Technology

  • Type: Book
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  • Published: 2017-12-19
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  • Publisher: CRC Press

Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five enti...

Properties of Advanced Semiconductor Materials
  • Language: en
  • Pages: 220

Properties of Advanced Semiconductor Materials

Containing the most reliable parameter values for each of these semiconductor materials, along with applicable references, these data are organized in a structured, logical way for each semiconductor material. * Reviews traditional semiconductor materials as well as new, advanced semiconductors. * Essential authoritative handbook on the properties of semiconductor materials.

Atomic Layer Processing
  • Language: en
  • Pages: 306

Atomic Layer Processing

Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It the...

Methods of Surface Analysis
  • Language: en
  • Pages: 356

Methods of Surface Analysis

  • Type: Book
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  • Published: 1990-04-12
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  • Publisher: CUP Archive

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Alkyl Polyglycosides
  • Language: de
  • Pages: 251

Alkyl Polyglycosides

The first comprehensive survey on the uses of alkyl polyglycosides as renewable ressources for the chemical industry. Experts from industry show in detail how alkyl polyglycosides can help chemists to improve their products. Since quite a few years, renewable Ressources are of increasing interest for the chemical industry. Alkyl polyglycosides are among the frequently used substances produces from renewable ressorces. Their science as well as technological applications are described in this book competently and with a focus on industrial use.

Surface effects in adhesion, friction, wear, and lubrication
  • Language: en
  • Pages: 643

Surface effects in adhesion, friction, wear, and lubrication

  • Type: Book
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  • Published: 1981-01-01
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  • Publisher: Elsevier

Surface effects in adhesion, friction, wear, and lubrication

Wagner's Melodies
  • Language: en
  • Pages: 463

Wagner's Melodies

Wagner's Melodies places the composer's ideas about melody in the context of the scientific discourse of his age.