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Fundamental Aspects of Silicon Oxidation
  • Language: en
  • Pages: 269

Fundamental Aspects of Silicon Oxidation

Discusses silicon oxidation in a tutorial fashion from both experimental and theoretical viewpoints. The authors report on the state of the art both at Lucent Technology and in academic research. The book will appeal to researchers and advanced students.

Defects in SiO2 and Related Dielectrics: Science and Technology
  • Language: en
  • Pages: 619

Defects in SiO2 and Related Dielectrics: Science and Technology

Silicon dioxide plays a central role in most contemporary electronic and photonic technologies, from fiber optics for communications and medical applications to metal-oxide-semiconductor devices. Many of these applications directly involve point defects, which can either be introduced during the manufacturing process or by exposure to ionizing radiation. They can also be deliberately created to exploit new technologies. This book provides a general description of the influence that point defects have on the global properties of the bulk material and their spectroscopic characterization through ESR and optical spectroscopy.

Defects in HIgh-k Gate Dielectric Stacks
  • Language: en
  • Pages: 516

Defects in HIgh-k Gate Dielectric Stacks

The main goal of this book is to review at the nano and atomic scale the very complex scientific issues that pertain to the use of advanced high dielectric constant (high-k) materials in next generation semiconductor devices. One of the key obstacles to integrate this novel class of materials into Si nano-technology are the electronic defects in high-k dielectrics. It has been established that defects do exist in high-k dielectrics and they play an important role in device operation. The unique feature of this book is a special focus on the important issue of defects. The subject is covered from various angles, including silicon technology, processing aspects, materials properties, electrica...

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface--4, 2000
  • Language: en
  • Pages: 562

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface--4, 2000

  • Type: Book
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  • Published: 2000
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  • Publisher: Unknown

None

Handbook of Thin Films, Five-Volume Set
  • Language: en
  • Pages: 3451

Handbook of Thin Films, Five-Volume Set

  • Type: Book
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  • Published: 2001-11-17
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  • Publisher: Elsevier

This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures. Thi...

Non-Crystalline Films for Device Structures
  • Language: en
  • Pages: 265

Non-Crystalline Films for Device Structures

  • Type: Book
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  • Published: 2001-12-11
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  • Publisher: Elsevier

Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Volume 29 consists of chapters pulled from Hari Singh Nalwa's forthcoming Handbook of Thin Film Materials (ISBN: 0-12-512908-4). The chapters were selected because they deal exclusively with amorphous film structures and because they have a common relevance to semiconductor, or electronic, devices and circuits. These are subjects not yet stressed in the Thin Films series.

Silicon Materials Science and Technology
  • Language: en
  • Pages: 894

Silicon Materials Science and Technology

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Semiconductor Silicon 2002
  • Language: en
  • Pages: 650

Semiconductor Silicon 2002

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Handbook of Semiconductor Manufacturing Technology
  • Language: en
  • Pages: 1720

Handbook of Semiconductor Manufacturing Technology

  • Type: Book
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  • Published: 2017-12-19
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  • Publisher: CRC Press

Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five enti...