You may have to Search all our reviewed books and magazines, click the sign up button below to create a free account.
An “excellent” history of the often overlooked WWII campaign in which Hitler secured a vital resource lifeline for the Third Reich (Library Journal). After Hitler conquered Poland and was still fine-tuning his plans against France, the British began to exert control over the coastline of neutral Norway, an action that threatened to cut off Germany’s iron-ore conduit to Sweden and outflank from the start its hegemony on the Continent. The Germans responded with a dizzying series of assaults, using every tool of modern warfare developed in the previous generation. Airlifted infantry, mountain troops, and paratroopers were dispatched to the north, seizing Norwegian strongpoints while fore...
Baumeister organizes this book around the key subjects associated with functions of optical thin film performance, and provides a valuable resource in the field of thin film technology. The information is widely backed up with citations to patents and published literature. The author draws from 25 years of experience teaching classes at the UCLA Extension Program, and at companies worldwide to answer questions, such as: what are the conventions for a given analysis formalism? and, what other design approaches have been tried for this application?
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar mate...
Popular Science gives our readers the information and tools to improve their technology and their world. The core belief that Popular Science and our readers share: The future is going to be better, and science and technology are the driving forces that will help make it better.
The book is designed as an introduction for engineers and researchers wishing to obtain a fundamental knowledge and a snapshot in time of the cutting edge in technology research. As a natural consequence, Nano and Giga Challenges is also an essential reference for the "gurus" wishing to keep abreast of the latest directions and challenges in microelectronic technology development and future trends. The combination of viewpoints presented within the book can help to foster further research and cross-disciplinary interaction needed to surmount the barriers facing future generations of technology design.Key Features:• Quickly becoming the hottest topic of the new millennium (2.4 billion dollars funding in US alone• Current status and future trends of micro and nanoelectronics research• Written by leading experts in the corresponding research areas• Excellent tutorial for graduate students and reference for "gurus"
A complete introduction to x-ray microscopy, covering optics, 3D and chemical imaging, lensless imaging, radiation damage, and applications.
None
This handbook--a sequel to the widely used Handbook of Optical Constants of Solids--contains critical reviews and tabulated values of indexes of refraction (n) and extinction coefficients (k) for almost 50 materials that were not covered in the original handbook. For each material, the best known n and k values have been carefully tabulated, from the x-ray to millimeter-wave region of the spectrum by expert optical scientists. In addition, the handbook features thirteen introductory chapters that discuss the determination of n and k by various techniques.* Contributors have decided the best values for n and k* References in each critique allow the reader to go back to the original data to examine and understand where the values have come from* Allows the reader to determine if any data in a spectral region needs to be filled in* Gives a wide and detailed view of experimental techniques for measuring the optical constants n and k* Incorporates and describes crystal structure, space-group symmetry, unit-cell dimensions, number of optic and acoustic modes, frequencies of optic modes, the irreducible representation, band gap, plasma frequency, and static dielectric constant
This volume is for practitioners, experimentalists, and graduate students in applied physics, particularly in the fields of atomic and molecular physics, who work with vacuum ultraviolet applications and are in need of choosing the best type of modern instrumentation. It provides first-hand knowledge of the state-of-the-art equipment sources and gives technical information on how to use it, along with a broad reference bibliography.Key Features* Aimed at experimentalists who are in need of choosing the best type of modern instrumentation in this applied field* Contains a detailed chapter on laboratory sources* Provides an up-to-date description of state-of-the-art equipment and techniques* Includes a broad reference bibliography