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Computer Simulation Studies in Condensed-Matter Physics VIII
  • Language: en
  • Pages: 185

Computer Simulation Studies in Condensed-Matter Physics VIII

Computer Simulation Studies in Condensed-Matter Physics VIII covers recent developments in this field presented at the 1995 workshop, such as new algorithms, methods of analysis, and conceptual developments. This volume is composed of three parts. The first part contains invited papers that deal with simulational studies of classical systems. The second part is devoted to invited papers on quantum systems, including new results for strongly correlated electron and quantum spin models. The final part comprises contributed presentations.

Nanostructures and Quantum Effects
  • Language: en
  • Pages: 354

Nanostructures and Quantum Effects

Nanostructures and Quantum Effects documents the most recent developments in the field of quantum effects in semiconductor nanostructures such as quantum wires and boxes. Interrelated topics such as quantum interference, low-dimensional electron transport, single-electron and microcavity effects, electron holography, and quantum measurements together with the most recent progress in epitaxial growth of nanostructures and the manipulation of atoms using STM-related approaches are covered.

Interfaces, Quantum Wells, and Superlattices
  • Language: en
  • Pages: 402

Interfaces, Quantum Wells, and Superlattices

The NATO Advanced Study Institute on "Interfaces, Quantum Wells and Superlattices" was held from August 16th to 29th, 1987, in Banff, Alberta, Canada. This volume contains most of the lectures that were given at the Institute. A few of the lectures had already been presented at an earlier meeting and appear instead in the proceedings of the NATO Advanced Study Institute on "Physics and Applications of Quantum Wells and Super lattices" held in Erice from April 21st to May 1st earlier in the year and published by Plenum Press. The study of semiconductor interfaces, quantum wells and super lattices has come to represent a substantial proportion of all work in condensed matter physics. In a sens...

Ultrathin Magnetic Structures I
  • Language: en
  • Pages: 358

Ultrathin Magnetic Structures I

The ability to understand and control the unique properties of interfaces has created an entirely new field of magnetism, with profound impact in technology and serving as the basis for a revolution in electronics. Our understanding of the physics of magnetic nanostructures has also advanced significantly. This rapid development has generated a need for a comprehensive treatment that can serve as an introduction to the field for those entering it from diverse fields, but which will also serve as a timely overview for those already working in this area. The four-volume work Ultra-Thin Magnetic Structures aims to fulfill this dual need. The original two volumes – now available once more – are An Introduction to the Electronic, Magnetic and Structural Properties (this volume) and "Measurement Techniques and Novel Magnetic Properties." Two new volumes, "Fundamentals of Nanomagnetism" and "Applications of Nanomagnetism," extend and complete this comprehensive work by presenting the foundations of spintronics.

Reflection High-Energy Electron Diffraction and Reflection Electron Imaging of Surfaces
  • Language: en
  • Pages: 526

Reflection High-Energy Electron Diffraction and Reflection Electron Imaging of Surfaces

This volume contains the papers presented at the NATO Advanced Research Workshop in "Reflection High Energy Electron Diffraction and Reflection Electron Imaging of Surfaces" held at the Koningshof conference center, Veldhoven, the Netherlands, June 15-19, 1987. The main topics of the workshop, Reflection High Energy Electron Diffraction (RHEED) and Reflection Electron Microscopy (REM), have a common basis in the diffraction processes which high energy electrons undergo when they interact with solid surfaces at grazing angles. However, while REM is a new technique developed on the basis of recent advances in transmission electron microscopy, RHEED is an old method in surface crystallography g...

Molecular Beam Epitaxy
  • Language: en
  • Pages: 394

Molecular Beam Epitaxy

This first-ever monograph on molecular beam epitaxy (MBE) gives a comprehensive presentation of recent developments in MBE, as applied to crystallization of thin films and device structures of different semiconductor materials. MBE is a high-vacuum technology characterized by relatively low growth temperature, ability to cease or initiate growth abruptly, smoothing of grown surfaces and interfaces on an atomic scale, and the unique facility for in situ analysis of the structural parameters of the growing film. The excellent exploitation parameters of such MBE-produced devices as quantum-well lasers, high electron mobility transistors, and superlattice avalanche photodiodes have caused this t...

Surface and Interface Characterization by Electron Optical Methods
  • Language: en
  • Pages: 321

Surface and Interface Characterization by Electron Optical Methods

The importance of real space imaging and spatially-resolved spectroscopy in many of the most significant problems of surface and interface behaviour is almost self evident. To join the expertise of the tradi tional surface scientist with that of the electron microscopist has however been a slow and difficult process. In the past few years remarkable progress has been achieved, including the development of new techniques of scanning transmission and reflection imaging as well as low energy microscopy, all carried out in greatly improved vacuum conditions. Most astonishing of all has been the advent of the scanning tunneling electron microscope providing atomic resolution in a manner readily c...

Evaluation of Advanced Semiconductor Materials by Electron Microscopy
  • Language: en
  • Pages: 413

Evaluation of Advanced Semiconductor Materials by Electron Microscopy

The last few years have ~een rapid improvements in semiconductor growth techniques which have produced an expanding range of high quality heterostructures for new semiconductor devises. As the dimensions of such structures approach the nanometer level, it becomes increasingly important to characterise materials properties such as composition uniformity, strain, interface sharpness and roughness and the nature of defects, as well as their influence on electrical and optical properties. Much of this information is being obtained by electron microscopy and this is also an area of rapid progress. There have been advances for thin film studies across a wide range of techniques, including, for exa...

Thin Films
  • Language: en
  • Pages: 708

Thin Films

Heteroepitaxial films are commonplace among today's electronic and photonic devices. The realization of new and better devices relies on the refinement of epitaxial techniques and improved understanding of the physics underlying epitaxial growth. This book provides an up-to-date report on a wide range of materials systems. The first half reviews metallic and dielectric thin films, including chapters on metals, rare earths, metal-oxide layers, fluorides, and high-c superconductors. The second half covers semiconductor systems, reviewing developments in group-IV, arsenide, phosphide, antimonide, nitride, II-VI and IV-VI heteroepitaxy. Topics important to several systems are covered in chapters on atomic processes, ordering and growth dynamics.

Molecular Beam Epitaxy and Heterostructures
  • Language: en
  • Pages: 718

Molecular Beam Epitaxy and Heterostructures

The NATO Advanced Study Institute on "Molecular Beam Epitaxy (MBE) and Heterostructures" was held at the Ettore Majorana Center for Scientific Culture, Erice, Italy, on March 7-19, 1983, the second course of the International School of Solid-State Device Re search. This volume contains the lectures presented at the Institute. Throughout the history of semiconductor development, the coupling between processing techniques and device structures for both scientific investigations and technological applications has time and again been demonstrated. Newly conceived ideas usually demand the ultimate in existing techniques, which often leads to process innova tions. The emergence of a process, on th...