You may have to Search all our reviewed books and magazines, click the sign up button below to create a free account.
The contrasting examples of microwave plasmas given in this volume demonstrate their capability of not only covering the totality of expressed needs in that particular field, but in many others. For example the ions and reactive neutral species, indispensable for the synergetic effects in etching and deposition processes can be used in metallurgical treatment, and for materials processing in general. They also have the ability to dissociate molecules and excite atoms as required in analytical chemistry where the information on the constituent concentrations is obtained through optical spectroscopy or mass spectrometry. Finally, microwave plasmas can supply the photons for laser and lighting ...
This book is the most comprehensive publication on MWP technology and MWP-OES analytical spectrometry with an emphasis on practical issues.
A practical introduction to microwave plasma for processing applications at a variety of pressures In Microwave Plasma Sources and Methods in Processing Technology, the authors deliver a comprehensive introduction to microwaves and microwave-generated plasmas. Ideal for anyone interested in non-thermal gas discharge plasmas and their applications, the book includes detailed descriptions, explanations, and practical guidance for the study and use of microwave power, microwave components, plasma, and plasma generation. This reference includes over 130 full-color diagrams to illustrate the concepts discussed within. The distinguished authors discuss the plasmas generated at different levels of ...
Plasma & High Frequency Processes for Obtaining & Processing Materials in the Nuclear Fuel Cycle
Recent research has brought the application of microwaves from the classical fields of heating, communication, and generation of plasma discharges into the generation of compact plasmas that can be used for applications such as FIB and small plasma thrusters. However, these new applications bring with them a new set of challenges. With coverage ranging from the basics to new and emerging applications, Compact Plasma and Focused Ion Beams discusses how compact high-density microwave plasmas with dimensions smaller than the geometrical cutoff dimension can be generated and utilized for providing focused ion beams of various elements. Starting with the fundamentals of the cutoff problem for wav...
For the first time, this comprehensive handbook presents the emerging field of microwave technology for the synthesis of nanoparticles. Divided into three parts--fundamentals, methods, and applications--it covers topics including microwave theory, scale-up, microwave plasma synthesis, characterization, and more. This offers both an important volume for academic researchers, and a resource for those in industry exploring the applications of nanoparticles in semiconductors, electronics, catalysis, sensors, and more.
Proceedings of a NATO ARW held in Vimeiro, Portugal, May 11-15, 1992
In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications. Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.
This authoritative reference presents a comprehensive review of the evolution of plasma science and technology fundamentals over the past five decades. One of this field’s principal challenges has been its multidisciplinary nature requiring coverage of fundamental plasma physics in plasma generation, transport phenomena under high-temperature conditions, involving momentum, heat and mass transfer, and high-temperature reaction kinetics, as well as fundamentals of material science under extreme conditions. The book is structured in five distinct parts, which are presented in a reader-friendly format allowing for detailed coverage of the science base and engineering aspects of the technology including plasma generation, mathematical modeling, diagnostics, and industrial applications of thermal plasma technology. This book is an essential resource for practicing engineers, research scientists, and graduate students working in the field.