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Science and Technology of Semiconductor Surface Preparation: Volume 477
  • Language: en
  • Pages: 576

Science and Technology of Semiconductor Surface Preparation: Volume 477

  • Type: Book
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  • Published: 1997-09-30
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  • Publisher: Unknown

The focus of semiconductor wafer processing is rapidly changing. Pure device performance is no longer sufficient to ensure a technology's success as IC chips approach 1GB. Yield, reliability, cost and manufacturability are principal drivers of the industry. Great strides have been made in understanding the science and impact of front-end (pre-metal) chemical surface preparations and are beginning to influence the 'real' technology and its evolution. Efforts in understanding particle and metals removal, along with Si surface etching and microroughness are prime examples of areas where work is beginning to pay off together with processes related to the back-end (post-metal). The focus of this ...

Flat-Panel Display Technologies
  • Language: en
  • Pages: 600

Flat-Panel Display Technologies

  • Type: Book
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  • Published: 1995-12-31
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  • Publisher: Elsevier

Large scale manufacturing of liquid crystal flat panel displays (LCDs) by Japan brought the world's attention to the existence of an enormous market potential exists when there are alternatives to the cathode ray tube (CRT). The Japanese have recognized that new display technologies are critical to making their products highly competitive in the world market. The CRT is losing market share to the solid-state flat panel display. Japan currently holds 90% of the market, and this book outlines opportunities in the former Soviet Union, where companies with the necessary technology are seeking partners, investment, and manufacturing opportunities. Entire cities that were once not even on the map due to their military mission, are now appearing, filled with state-of-the-art electronic technology. The book is developed from the reports issued by investigators based on their field visits to 33 sites in Japan, and 26 sites in Russia, Ukraine, and Belarus.

Handbook of Silicon Wafer Cleaning Technology
  • Language: en
  • Pages: 749

Handbook of Silicon Wafer Cleaning Technology

The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cle...

Porous Silicon
  • Language: en
  • Pages: 496

Porous Silicon

Due to the recent discovery of the room-temperature visible light emission from porous silicon (P-Si), a great interest in P-Si and related materials has arisen in the last decade of the 20th century. Crystalline (c-) Si, at the heart of integrated circuits, has an indirect band gap of 1.1 eV, which limits its application in optoelectronics. The visible light emitting P-Si may open a new field combining Si integrated technology and optoelectronics. This book is a comprehensive review of the recent research and development of porous silicon. Strong visible photoluminescence (PL) and electroluminescence (EL) from P-Si and other forms of silicon nanocrystallites (nc-Si) are reviewed. Several proposed mechanisms for the PL from porous silicon such as quantum confinement, amorphicity and molecular PL are studied. The following issues are covered: mechanisms for the visible light emission, physical structures, studies of the PL and EL, correlation of structure and optical studies, surface physics and chemistry, relationships among various forms (P-Si, a-Si, µc-Si), device applications, future developments.

Laser and Particle-Beam Chemical Processing for Microelectronics:
  • Language: en
  • Pages: 534

Laser and Particle-Beam Chemical Processing for Microelectronics:

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Official Gazette of the United States Patent and Trademark Office
  • Language: en
  • Pages: 1496

Official Gazette of the United States Patent and Trademark Office

  • Type: Book
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  • Published: 2000
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  • Publisher: Unknown

None

Rapid Thermal and Integrated Processing
  • Language: en
  • Pages: 534

Rapid Thermal and Integrated Processing

  • Type: Book
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  • Published: 1991
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  • Publisher: Unknown

None

Research & Development
  • Language: en
  • Pages: 320

Research & Development

  • Type: Book
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  • Published: 2006
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  • Publisher: Unknown

None

Lasers
  • Language: en
  • Pages: 214

Lasers

Developments in lasers continue to enable progress in many areas such as eye surgery, the recording industry and dozens of others. This book presents citations from the book literature for the last 25 years and groups them for ease of access which is also provided by subject, author and titles indexes.